H05G 2/003
The plasma being generated from a material in a liquid or gas
Official title: {the plasma being generated from a material in a liquid or gas state}
H05G2/003 (The plasma being generated from a material in a liquid or gas) appears on 195 US grants and 230 published applications in this corpus.
Search patents in H05G- Granted patents
- 195
- Published applications
- 230
- Assignees
- 81
- Inventors
- 421
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 2 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 2 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 3 | 0 |
| 2000 | 3 | 0 |
| 2001 | 4 | 0 |
| 2002 | 4 | 9 |
| 2003 | 4 | 3 |
| 2004 | 7 | 13 |
| 2005 | 7 | 5 |
| 2006 | 9 | 9 |
| 2007 | 2 | 12 |
| 2008 | 12 | 15 |
| 2009 | 13 | 4 |
| 2010 | 7 | 4 |
| 2011 | 4 | 8 |
| 2012 | 3 | 4 |
| 2013 | 7 | 5 |
| 2014 | 5 | 7 |
| 2015 | 6 | 3 |
| 2016 | 3 | 9 |
| 2017 | 11 | 6 |
| 2018 | 2 | 6 |
| 2019 | 5 | 3 |
| 2020 | 9 | 13 |
| 2021 | 6 | 7 |
| 2022 | 8 | 13 |
| 2023 | 12 | 18 |
| 2024 | 13 | 15 |
| 2025 | 10 | 23 |
| 2026 | 9 | 16 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Extreme ultraviolet light generation apparatus and electronic device manufacturing method29 Sep 2026US 12,750,939 B2Gigaphoton Inc.
- Apparatus and method for generating X-rays by laser irradiation of superfluid helium droplets1 Sep 2026US 12,727,071 B2Class 5 Photonics GmbH
- Electromagnetic pump30 Jun 2026US 12,672,225 B2Excillum AB
- Droplet generator assembly and method of replacing components2 Jun 2026US 12,648,073 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Droplet generator assembly and method of replacing components2 Jun 2026US 12,648,074 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Debris catcher, rotating target extreme ultraviolet (euv) radiation generation system, method of generating euv radiation, method of inspecting photomask, method of manufacturing semiconductor device27 Aug 2026US 2026/0251986 A1Taiwan Semiconductor Manufacturing Company.Ltd
- X-ray analysis system with laser-driven source13 Aug 2026US 2026/0239520 A1Bruker Technologies Ltd.
- Method and laser apparatus for generating aneuv light-emitting plasma of a target material13 Aug 2026US 2026/0239521 A1TRUMPF Lasersystems for Semiconductor Manufacturing GmbH
- Light source device30 Jul 2026US 2026/0223274 A1Lasertec Corporation
- A droplet stream alignment mechanism and method thereof9 Jul 2026US 2026/0197927 A1ASML Netherlands B. V.
Most cited
By later US patents
- Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications210US 6,031,241 AUniversity of Central Florida · 2000
- Plasma focus high energy photon source93US 5,763,930 ACymer, Inc. · 1998
- Plasma focus high energy photon source91US 6,064,072 ACymer, Inc. · 2000
- Configurations, materials and wavelengths for EUV lithium plasma discharge lamps76US 5,963,616 AUniversity of Central Florida · 1999
- Plasma focus high energy photon source with blast shield76US 6,452,199 B1Cymer, Inc. · 2002