H05G 2/00
Apparatus or processes specially adapted for producing x-rays, not involving x-ray tubes
Official title: Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma (X-ray lasers H01S4/00)
H05G2/00 (Apparatus or processes specially adapted for producing x-rays, not involving x-ray tubes) appears on 1,819 US grants and 1,972 published applications in this corpus.
Search patents in H05G- Granted patents
- 1,819
- Published applications
- 1,972
- Assignees
- 376
- Inventors
- 2,356
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 2 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 3 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 5 | 0 |
| 1986 | 10 | 0 |
| 1987 | 6 | 0 |
| 1988 | 6 | 0 |
| 1989 | 5 | 0 |
| 1990 | 8 | 0 |
| 1991 | 3 | 0 |
| 1992 | 1 | 0 |
| 1993 | 3 | 0 |
| 1994 | 5 | 0 |
| 1995 | 6 | 0 |
| 1996 | 10 | 0 |
| 1997 | 5 | 0 |
| 1998 | 4 | 0 |
| 1999 | 8 | 0 |
| 2000 | 16 | 0 |
| 2001 | 20 | 4 |
| 2002 | 20 | 24 |
| 2003 | 19 | 23 |
| 2004 | 29 | 43 |
| 2005 | 27 | 44 |
| 2006 | 39 | 56 |
| 2007 | 40 | 56 |
| 2008 | 47 | 61 |
| 2009 | 52 | 50 |
| 2010 | 39 | 73 |
| 2011 | 41 | 73 |
| 2012 | 54 | 73 |
| 2013 | 78 | 85 |
| 2014 | 97 | 123 |
| 2015 | 86 | 103 |
| 2016 | 105 | 130 |
| 2017 | 130 | 93 |
| 2018 | 91 | 93 |
| 2019 | 111 | 99 |
| 2020 | 112 | 130 |
| 2021 | 92 | 100 |
| 2022 | 103 | 99 |
| 2023 | 85 | 108 |
| 2024 | 78 | 86 |
| 2025 | 73 | 82 |
| 2026 | 42 | 61 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- High brightness LPP EUV light source with fast rotating target and method of cooling thereof6 Oct 2026US 12,757,310 B2Isteq Group Holding B.V.
- Optical system and method for a radiation source6 Oct 2026US 12,757,311 B2ASML Netherlands B. V.
- Extreme ultraviolet light source device6 Oct 2026US 12,757,312 B2Samsung Electronics Co., Ltd.
- System and method for monitoring and controlling extreme ultraviolet photolithography processes29 Sep 2026US 12,748,353 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Extreme ultraviolet light generation apparatus and electronic device manufacturing method29 Sep 2026US 12,750,939 B2Gigaphoton Inc.
- Extreme ultraviolet lithography system8 Oct 2026US 2026/0310108 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Optical system, method of use, and method of fabrication1 Oct 2026US 2026/0299429 A1xLight Inc.
- Laser synchronization with target motion for euv source optimization1 Oct 2026US 2026/0304584 A1KLA Corporation
- Semiconductor system inspection tool and methods of operation1 Oct 2026US 2026/0304585 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Fluid dispensing system and method24 Sep 2026US 2026/0290766 A1ASML Netherlands B. V.
Most cited
By later US patents
- Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source260US 7,196,342 B2Cymer, Inc. · 2007
- Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications210US 6,031,241 AUniversity of Central Florida · 2000
- High brightness X-ray metrology162US 7,929,667 B1KLA-Tencor Corporation · 2011
- Collector in an extreme ultraviolet lithography system with optimal air curtain protection151US 9,869,934 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2018
- Elliptically polarizing adjustable phase insertion device140US 5,383,049 AThe Board of Trustees of the Leland Stanford University · 1995