H05G 2/002
Supply of the plasma generating material
Official title: {Supply of the plasma generating material}
H05G2/002 (Supply of the plasma generating material) appears on 667 US grants and 751 published applications in this corpus.
Search patents in H05G- Granted patents
- 667
- Published applications
- 751
- Assignees
- 118
- Inventors
- 927
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 2 | 0 |
| 1987 | 2 | 0 |
| 1988 | 2 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 2 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 2 | 0 |
| 2000 | 6 | 0 |
| 2001 | 7 | 3 |
| 2002 | 4 | 7 |
| 2003 | 9 | 9 |
| 2004 | 9 | 18 |
| 2005 | 14 | 15 |
| 2006 | 14 | 19 |
| 2007 | 7 | 14 |
| 2008 | 20 | 25 |
| 2009 | 20 | 16 |
| 2010 | 9 | 25 |
| 2011 | 13 | 21 |
| 2012 | 18 | 30 |
| 2013 | 29 | 29 |
| 2014 | 36 | 47 |
| 2015 | 24 | 31 |
| 2016 | 35 | 48 |
| 2017 | 42 | 31 |
| 2018 | 34 | 30 |
| 2019 | 43 | 45 |
| 2020 | 43 | 42 |
| 2021 | 32 | 44 |
| 2022 | 50 | 51 |
| 2023 | 34 | 57 |
| 2024 | 42 | 33 |
| 2025 | 36 | 31 |
| 2026 | 21 | 30 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- High brightness LPP EUV light source with fast rotating target and method of cooling thereof6 Oct 2026US 12,757,310 B2Isteq Group Holding B.V.
- System and method for monitoring and controlling extreme ultraviolet photolithography processes29 Sep 2026US 12,748,353 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Extreme ultraviolet light generation apparatus and electronic device manufacturing method29 Sep 2026US 12,750,939 B2Gigaphoton Inc.
- Source material delivery system, EUV radiation system, lithographic apparatus, and methods thereof15 Sep 2026US 12,739,961 B2ASML Netherlands B. V.
- Apparatus and method for generating X-rays by laser irradiation of superfluid helium droplets1 Sep 2026US 12,727,071 B2Class 5 Photonics GmbH
- Extreme ultraviolet lithography system8 Oct 2026US 2026/0310108 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Fluid dispensing system and method24 Sep 2026US 2026/0290766 A1ASML Netherlands B. V.
- Extreme ultraviolet light generation apparatus and electronic device manufacturing method17 Sep 2026US 2026/0282202 A1Gigaphoton Inc.
- Electric field induced liquid jet breakup into a chain of droplets10 Sep 2026US 2026/0271169 A1KLA Corporation
- Method and laser apparatus for generating aneuv light-emitting plasma of a target material13 Aug 2026US 2026/0239521 A1TRUMPF Lasersystems for Semiconductor Manufacturing GmbH
Most cited
By later US patents
- Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications210US 6,031,241 AUniversity of Central Florida · 2000
- High brightness X-ray metrology162US 7,929,667 B1KLA-Tencor Corporation · 2011
- Collector in an extreme ultraviolet lithography system with optimal air curtain protection151US 9,869,934 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2018
- Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources91US 5,577,092 A1996
- EUV light source80US 7,164,144 B2Cymer, Inc. · 2007