H05G 2/0027
Arrangements for controlling the supply
Official title: {Arrangements for controlling the supply; Arrangements for measurements}
H05G2/0027 (Arrangements for controlling the supply) appears on 292 US grants and 341 published applications in this corpus.
Search patents in H05G- Granted patents
- 292
- Published applications
- 341
- Assignees
- 58
- Inventors
- 483
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 3 | 0 |
| 2002 | 0 | 3 |
| 2003 | 3 | 3 |
| 2004 | 3 | 4 |
| 2005 | 2 | 8 |
| 2006 | 6 | 7 |
| 2007 | 4 | 8 |
| 2008 | 14 | 13 |
| 2009 | 9 | 5 |
| 2010 | 4 | 8 |
| 2011 | 3 | 10 |
| 2012 | 6 | 8 |
| 2013 | 11 | 16 |
| 2014 | 13 | 15 |
| 2015 | 8 | 12 |
| 2016 | 17 | 22 |
| 2017 | 17 | 15 |
| 2018 | 12 | 14 |
| 2019 | 18 | 17 |
| 2020 | 20 | 21 |
| 2021 | 17 | 24 |
| 2022 | 27 | 28 |
| 2023 | 14 | 27 |
| 2024 | 23 | 19 |
| 2025 | 18 | 17 |
| 2026 | 14 | 17 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- System and method for monitoring and controlling extreme ultraviolet photolithography processes29 Sep 2026US 12,748,353 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Extreme ultraviolet light generation apparatus and electronic device manufacturing method29 Sep 2026US 12,750,939 B2Gigaphoton Inc.
- Source material delivery system, EUV radiation system, lithographic apparatus, and methods thereof15 Sep 2026US 12,739,961 B2ASML Netherlands B. V.
- Freeze valve in a target material generator18 Aug 2026US 12,710,104 B2ASML Netherlands B. V.
- Method and apparatus for controlling droplet in extreme ultraviolet light source28 Jul 2026US 12,693,599 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Extreme ultraviolet light generation apparatus and electronic device manufacturing method17 Sep 2026US 2026/0282202 A1Gigaphoton Inc.
- Illumination source and associated metrology apparatus23 Jul 2026US 2026/0210692 A1ASML Netherlands B. V.
- A droplet stream alignment mechanism and method thereof9 Jul 2026US 2026/0197927 A1ASML Netherlands B. V.
- Extreme ultraviolet light generation system and electronic device manufacturing method21 May 2026US 2026/0143576 A1Gigaphoton Inc.
- Processing method of target supply device and electronic device manufacturing method14 May 2026US 2026/0136449 A1Gigaphoton Inc.
Most cited
By later US patents
- Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources91US 5,577,092 A1996
- EUV light source80US 7,164,144 B2Cymer, Inc. · 2007
- X-ray source and X-ray lithography method79US 4,635,282 ANippon Telegraph & Telephone Public Corporation · 1987
- Plasma focus light source with active and buffer gas control75US 6,586,757 B2Cymer, Inc. · 2003
- High repetition rate laser produced plasma EUV light source70US 7,087,914 B2Cymer, Inc. · 2006