X-ray source and X-ray lithography method

An X-ray lithography method comprising the steps of:

• forming a gas jet for the production of a plasma between a pair of cylindrical electrodes substantially in coaxially opposed relationship with each other in a vacuum vessel, at least one of said pair of electrodes having a hole for passing X-rays;
• applying a voltage between said pair of electrodes to perform discharge therebetween so that a discharge plasma is produced between said pair of electrodes, a linear plasma with a high temperature and a high density being produced by the pinch of the plasma due to its own magnetic field produced by the current flowing through the plasma, so that X-rays are emitted from said linear plasma and derived in the direction of the axis of said linear plasma produced substantially along the axis of said pair of electrodes;
• extracting said X-rays through both an X-ray passing window of an electrically grounded beam reflector and an X-ray extraction window located below said pair of electrodes along the axis of said pair of electrodes, said beam reflector being interposed between said pair of electrodes and said X-ray extracting window and having a reflecting plane which is inclined at a predetermined angle relative to the axis of said pair of electrodes so that charged particles emitted from said plasma, said plasma, and gases are reflected by said reflecting plane;
• and
• exposing a wafer by the emitted X-rays through an X-ray exposure mask, said X-ray exposure mask and said wafer being so arranged along the axis of said linear plasma that the surfaces of said X-ray exposure mask and said wafer are perpendicular to the axis of said linear plasma.