Extreme ultraviolet light generation system and electronic device manufacturing method

An electronic device manufacturing method, comprising:

• generating extreme ultraviolet light using an extreme ultraviolet light generation system;
• outputting the extreme ultraviolet light to an exposure apparatus;
• and
• exposing a photosensitive substrate to the extreme ultraviolet light in the exposure apparatus to manufacture an electronic device,
• the extreme ultraviolet light generation system being configured to generate the extreme ultraviolet light by irradiating targets with pulse laser light, and comprising:
• a chamber;
• a target supply unit configured to continuously generate the targets at a specific time interval and supply the targets into the chamber;
• a timing sensor configured to detect the target passing through a first region and output a signal;
• a laser device configured to radiate the pulse laser light toward the target having passed through the first region;
• and
• a processor configured to obtain first time when a first target has passed through the first region from the signal and second time when a second target generated immediately before the first target has passed through the first region, and determine a timing at which the first target is irradiated with the pulse laser light of the laser device based on the first time, the second time, and the time interval.

An electronic device manufacturing method, comprising:

• inspecting a defect of a mask by irradiating the mask with extreme ultraviolet light generated by an extreme ultraviolet light generation system;
• selecting a mask using a result of the inspection;
• and
• exposing and transferring a pattern formed on the selected mask onto a photosensitive substrate,
• the extreme ultraviolet light generation system being configured to generate the extreme ultraviolet light by irradiating targets with pulse laser light, and comprising:
• a chamber;
• a target supply unit configured to continuously generate the targets at a specific time interval and supply the targets into the chamber;
• a timing sensor configured to detect the target passing through a first region and output a signal;
• a laser device configured to radiate the pulse laser light toward the target having passed through the first region;
• and
• a processor configured to obtain first time when a first target has passed through the first region from the signal and second time when a second target generated immediately before the first target has passed through the first region, and determine a timing at which the first target is irradiated with the pulse laser light of the laser device based on the first time, the second time, and the time interval.