H05G 2/0023
Constructional details of the ejection system
Official title: {Constructional details of the ejection system}
H05G2/0023 (Constructional details of the ejection system) appears on 201 US grants and 229 published applications in this corpus.
Search patents in H05G- Granted patents
- 201
- Published applications
- 229
- Assignees
- 58
- Inventors
- 401
- Latest grant
- 1 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 2 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 5 | 0 |
| 2001 | 4 | 1 |
| 2002 | 3 | 3 |
| 2003 | 5 | 2 |
| 2004 | 3 | 6 |
| 2005 | 5 | 3 |
| 2006 | 3 | 6 |
| 2007 | 2 | 4 |
| 2008 | 7 | 4 |
| 2009 | 3 | 5 |
| 2010 | 1 | 6 |
| 2011 | 2 | 3 |
| 2012 | 2 | 8 |
| 2013 | 8 | 10 |
| 2014 | 14 | 21 |
| 2015 | 12 | 7 |
| 2016 | 10 | 7 |
| 2017 | 8 | 6 |
| 2018 | 5 | 11 |
| 2019 | 14 | 13 |
| 2020 | 10 | 13 |
| 2021 | 9 | 8 |
| 2022 | 13 | 18 |
| 2023 | 10 | 24 |
| 2024 | 15 | 8 |
| 2025 | 20 | 20 |
| 2026 | 3 | 12 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
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- A droplet stream alignment mechanism and method thereof9 Jul 2026US 2026/0197927 A1ASML Netherlands B. V.
- Droplet generator and method of servicing extreme ultraviolet imaging tool11 Jun 2026US 2026/0164528 A1Taiwan Semiconductor Manufacturing Company.Ltd
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Most cited
By later US patents
- Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications210US 6,031,241 AUniversity of Central Florida · 2000
- Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources91US 5,577,092 A1996
- EUV light source80US 7,164,144 B2Cymer, Inc. · 2007
- Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit69US 6,493,423 B1Koninklijke Philips Electronics N. V. · 2002
- Method and apparatus for EUV plasma source target delivery69US 7,405,416 B2Cymer, Inc. · 2008