Tilt stage, extreme ultraviolet light generation apparatus, and electronic device manufacturing method

An extreme ultraviolet light generation apparatus comprising:

• a chamber;
• a target supply device configured to supply a target to a predetermined region in the chamber;
• a position stage configured to adjust a position of the target supply device;
• a target sensor configured to detect a trajectory of the target;
• a processor;
• and
• a tilt stage,
• the tilt stage including:
• a mounting table on which the target supply device is mounted;
• a rotation support portion configured to support the mounting table rotatably about at least first and second axes;
• a first tilt support portion including a first ball and a first contact surface in contact with the first ball and supporting the mounting table;
• a first adjuster configured to adjust posture of the target supply device by moving one of the first ball and the first contact surface in a first direction that is different from both a direction perpendicular to the first contact surface and a direction parallel to the first contact surface so that the first ball rolls on the first contact surface;
• a second tilt support portion including a second ball and a second contact surface in contact with the second ball and supporting the mounting table;
• and
• a second adjuster configured to adjust the posture of the target supply device by moving one of the second ball and the second contact surface in a second direction that is different from both a direction perpendicular to the second contact surface and a direction parallel to the second contact surface so that the second ball rolls on the second contact surface,
• wherein the rotation support portion includes a third ball, a relative position of the third ball with respect to the chamber is fixed, and a relative position of the third ball with respect to the mounting table is fixed, and
• the processor performs coarse adjustment of the trajectory of the target by controlling the tilt stage based on a detection result of the target sensor and performs fine adjustment of the trajectory of the target by controlling the position stage based on the detection result.

An electronic device manufacturing method, comprising:

• generating extreme ultraviolet light using an extreme ultraviolet light generation apparatus;
• outputting the extreme ultraviolet light to an exposure apparatus;
• and
• exposing a photosensitive substrate to the extreme ultraviolet light in the exposure apparatus to manufacture an electronic device,
• the extreme ultraviolet light generation apparatus including:
• a chamber;
• a target supply device configured to supply a target to a predetermined region in the chamber;
• and
• a tilt stage,
• the tilt stage including:
• a mounting table on which the target supply device is mounted;
• a rotation support portion configured to support the mounting table rotatably about at least first and second axes;
• a first tilt support portion including a first ball and a first contact surface in contact with the first ball and supporting the mounting table;
• a first adjuster configured to adjust posture of the target supply device by moving one of the first ball and the first contact surface in a first direction that is different from both a direction perpendicular to the first contact surface and a direction parallel to the first contact surface so that the first ball rolls on the first contact surface;
• a second tilt support portion including a second ball and a second contact surface in contact with the second ball and supporting the mounting table;
• and
• a second adjuster configured to adjust the posture of the target supply device by moving one of the second ball and the second contact surface in a second direction that is different from both a direction perpendicular to the second contact surface and a direction parallel to the second contact surface so that the second ball rolls on the second contact surface,
• wherein the rotation support portion includes a third ball, a relative position of the third ball with respect to the chamber is fixed, and a relative position of the third ball with respect to the mounting table is fixed, and
• the rotation support portion is intersected by both a first virtual plane, which passes through the first ball and is parallel to both a direction perpendicular to the first contact surface and the first direction, and a second virtual plane, which passes through the second ball and is parallel to both a direction perpendicular to the second contact surface and the second direction.

An electronic device manufacturing method, comprising:

• inspecting a defect of a mask by irradiating the mask with extreme ultraviolet light generated by an extreme ultraviolet light generation apparatus;
• selecting a mask using a result of the inspection;
• and
• exposing and transferring a pattern formed on the selected mask onto a photosensitive substrate,
• the extreme ultraviolet light generation apparatus including:
• a chamber;
• a target supply device configured to supply a target to a predetermined region in the chamber;
• and
• a tilt stage,
• the tilt stage including:
• a mounting table on which the target supply device is mounted;
• a rotation support portion configured to support the mounting table rotatably about at least first and second axes;
• a first tilt support portion including a first ball and a first contact surface in contact with the first ball and supporting the mounting table;
• a first adjuster configured to adjust posture of the target supply device by moving one of the first ball and the first contact surface in a first direction that is different from both a direction perpendicular to the first contact surface and a direction parallel to the first contact surface so that the first ball rolls on the first contact surface;
• a second tilt support portion including a second ball and a second contact surface in contact with the second ball and supporting the mounting table;
• and
• a second adjuster configured to adjust the posture of the target supply device by moving one of the second ball and the second contact surface in a second direction that is different from both a direction perpendicular to the second contact surface and a direction parallel to the second contact surface so that the second ball rolls on the second contact surface,
• wherein the rotation support portion includes a third ball, a relative position of the third ball with respect to the chamber is fixed, and a relative position of the third ball with respect to the mounting table is fixed, and
• the rotation support portion is intersected by both a first virtual plane, which passes through the first ball and is parallel to both a direction perpendicular to the first contact surface and the first direction, and a second virtual plane, which passes through the second ball and is parallel to both a direction perpendicular to the second contact surface and the second direction.