Target supply device and electronic device manufacturing method
AssigneeGigaphoton Inc.
InventorMasaki Nakano
Life of this patent
Estimating the term…
Abstract
A target supply device is configured to supply a liquid state target substance including tin to a concentration position of laser light to generate EUV light. The target supply device includes a tank configured to contain the target substance; and a nozzle communicating with an inside of the tank, and having a nozzle hole through which the target substance passes. Here, an uneven structure is formed on a surface of the nozzle provided with the nozzle hole and facing the concentration position and exhibits tin repellency larger than tin repellency exhibited by a material of the surface.
Claims11
A target supply device configured to supply a liquid state target substance including tin to a concentration position of laser light to generate EUV light, the target supply device comprising:
- a tank configured to contain the target substance;
- and
- a nozzle communicating with an inside of the tank, and having a nozzle hole through which the target substance passes,
- an uneven structure being formed on a surface of the nozzle provided with the nozzle hole and facing the concentration position, the uneven structure exhibiting tin repellency larger than tin repellency exhibited by a material of the surface.
An electronic device manufacturing method, comprising:
- outputting EUV light generated using an EUV light generation apparatus including a target supply device to an exposure apparatus;
- and
- exposing a photosensitive substrate to the EUV light in the exposure apparatus to manufacture an electronic device,
- the target supply device configured to supply a liquid state target substance including tin to a concentration position of laser light to generate the EUV light, and including:
- a tank configured to contain the target substance;
- and
- a nozzle communicating with an inside of the tank, and having a nozzle hole through which the target substance passes,
- an uneven structure being formed on a surface of the nozzle provided with the nozzle hole and facing the concentration position, the uneven structure exhibiting tin repellency larger than tin repellency exhibited by a material of the surface.
An electronic device manufacturing method, comprising:
- inspecting a defect of a mask by irradiating the mask with EUV light generated using an EUV light generation apparatus including a target supply device;
- selecting a mask using a result of the inspection;
- and
- exposing and transferring a pattern formed on the selected mask onto a photosensitive substrate,
- the target supply device configured to supply a liquid state target substance including tin to a concentration position of laser light to generate the EUV light, and including:
- a tank configured to contain the target substance;
- and
- a nozzle communicating with an inside of the tank, and having a nozzle hole through which the target substance passes,
- an uneven structure being formed on a surface of the nozzle provided with the nozzle hole and facing the concentration position, the uneven structure exhibiting tin repellency larger than tin repellency exhibited by a material of the surface.
Dependencies are inferred from the claim text.