H05G 2/0025
Systems for collecting the plasma generating material after the plasma generation
Official title: {Systems for collecting the plasma generating material after the plasma generation}
H05G2/0025 (Systems for collecting the plasma generating material after the plasma generation) appears on 88 US grants and 92 published applications in this corpus.
Search patents in H05G- Granted patents
- 88
- Published applications
- 92
- Assignees
- 25
- Inventors
- 159
- Latest grant
- 6 Jan 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 1 | 0 |
| 2004 | 0 | 0 |
| 2005 | 1 | 1 |
| 2006 | 0 | 1 |
| 2007 | 0 | 1 |
| 2008 | 1 | 3 |
| 2009 | 3 | 1 |
| 2010 | 0 | 8 |
| 2011 | 3 | 4 |
| 2012 | 4 | 5 |
| 2013 | 8 | 3 |
| 2014 | 5 | 7 |
| 2015 | 6 | 4 |
| 2016 | 1 | 6 |
| 2017 | 8 | 4 |
| 2018 | 4 | 2 |
| 2019 | 5 | 5 |
| 2020 | 8 | 7 |
| 2021 | 4 | 10 |
| 2022 | 9 | 6 |
| 2023 | 7 | 6 |
| 2024 | 5 | 3 |
| 2025 | 3 | 2 |
| 2026 | 1 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Semiconductor processing tool and methods of operation6 Jan 2026US 12,520,385 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Light source apparatus9 Sep 2025US 12,414,218 B2Ushio Denki Kabushiki Kaisha
- Particle transfer blocking device and lithography device using electron layer in vacuum system26 Aug 2025US 12,400,822 B2Derkwoo Semitech Co., Ltd.
- Extreme ultraviolet lithography system5 Aug 2025US 12,379,675 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Extreme ultraviolet lithography system6 Aug 2024US 12,055,865 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Extreme ultraviolet lithography system8 Oct 2026US 2026/0310108 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Extreme ultraviolet light generation apparatus and electronic device manufacturing method9 Apr 2026US 2026/0101428 A1Gigaphoton Inc.
- Semiconductor processing tool and methods of operation2 Apr 2026US 2026/0095978 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Solid target substance replenishment device, extreme ultraviolet light generation apparatus, and electronic device manufacturing method25 Sep 2025US 2025/0301560 A1Gigaphoton Inc.
- Shield-integrated rotational disk euv light source device including fragment shield17 Jul 2025US 2025/0234447 A1ESOL Inc.
Most cited
By later US patents
- High brightness X-ray metrology162US 7,929,667 B1KLA-Tencor Corporation · 2011
- Systems and methods for target material delivery in a laser produced plasma EUV light source43US 7,872,245 B2Cymer, Inc. · 2011
- X-ray-generation devices, X-ray microlithography apparatus comprising same, and microelectronic-device fabrication methods utilizing same41US 6,507,641 B1Nikon Corporation · 2003
- Systems and methods for target material delivery protection in a laser produced plasma EUV light source33US 8,263,953 B2Cymer, Inc. · 2012
- Water laser plasma x-ray point sources28US 5,577,091 AUniversity of Central Florida · 1996