Particle transfer blocking device and lithography device using electron layer in vacuum system

A lithography device comprising:

• a vacuum chamber in which an accommodation part is formed;
• and
• a barrier module which is provided in the vacuum chamber and divides configured with one or more electron beams which divide the accommodation part of the chamber into a first region where a light source for lithography is located and a second region where a substrate is located;
• wherein the barrier module is not a physical barrier but an electrical potential barrier for (i) blocking transfer of first particles with originally negative charge and (ii) negatively charging particles with originally positive charge or without charge to generate negatively-charged second particles and then blocking transfer of the second particles, such that the first particles and the second particles located in the first region are prevented from transferring to the second region due to electromagnetic repulsion, and
• wherein, the barrier module includes an electron beam generator installed on one side inside the chamber and an electron beam receptor installed on an opposite side inside the chamber, wherein the electron beam receptor receives one or more electron beams generated by the electron beam generator.