X-ray-generation devices, X-ray microlithography apparatus comprising same, and microelectronic-device fabrication methods utilizing same

An X-ray-generation device, comprising:

• first and second electrodes configured and situated relative to each other such that a voltage pulse applied across the electrodes forms a plasma between the electrodes and concentrates the plasma at a location adjacent the first electrode;
• and
• a target-material supply mechanism configured to introduce, during operation of the device, the target material as a supersonic gas stream at the location so as to cause the concentrated plasma to produce soft-X-ray radiation having a spectral profile characteristic of the target material.

An X-ray-generation device, comprising:

• first and second electrodes configured and situated relative to each other such that a voltage pulse applied across the electrodes forms a plasma between the electrodes and concentrates the plasma at a location adjacent the first electrode;
• and
• a target-material supply mechanism configured to suspend particles of a target material in a carrier gas and to discharge the suspension at the location during operation of the device.

An X-ray-generation device, comprising:

• first and second electrodes configured and situated relative to each other such that a voltage pulse applied across the electrodes forms a plasma between the electrodes and concentrates the plasma at a location adjacent the first electrode;
• and
• a target-material supply mechanism configured to deliver, during operation of the device, a focused stream of a target material at the location, the stream being of discrete liquid droplets of target material, discrete particles of the target material, a continuous liquid stream of target material, or a continuous gaseous stream of target material.

An X-ray-generation device, comprising:

• first and second electrodes configured and situated relative to each other such that a voltage pulse applied across the electrodes forms a plasma between the electrodes and concentrates the plasma at a location adjacent the first electrode;
• and
• a target-material supply mechanism configured to deliver, during operation of the device, a target material from at least one of the electrodes to the location.

An X-ray-generation device, comprising:

• first and second electrodes configured and situated relative to each other such that a voltage pulse applied across the electrodes forms a plasma between the electrodes and concentrates the plasma at a location adjacent the first electrode;
• and
• a target-material supply mechanism configured to deliver, during operation of the device, lithium hydroxide to the location, the lithium hydroxide being formulated as discrete solid particles, a suspension, a solution, or a gas.

A soft-X-ray (SXR) source, comprising:

• a dense plasma focus (DPF) device configured to produce a plasma;
• and
• a target-material-supply mechanism configured to continuously or intermittently supply, during operation of the dense plasma focus device, a target material to the plasma to cause the plasma to produce soft-X-ray radiation having a spectral profile characteristic of the target material.

In a method for producing a flux of soft X-ray (SXR) radiation using a dense plasma focus (DPF) device, an improvement comprising, while operating the DPF device to produce a plasma, continuously or intermittently supplying a target material to the plasma to cause the plasma to produce soft-X-ray radiation having a spectral profile characteristic of the target material.