H05G 2/008
Involving an energy-carrying beam in the process of plasma generation
Official title: {involving an energy-carrying beam in the process of plasma generation}
H05G2/008 (Involving an energy-carrying beam in the process of plasma generation) appears on 581 US grants and 727 published applications in this corpus.
Search patents in H05G- Granted patents
- 581
- Published applications
- 727
- Assignees
- 103
- Inventors
- 862
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 1 | 5 |
| 2003 | 2 | 4 |
| 2004 | 4 | 7 |
| 2005 | 6 | 13 |
| 2006 | 8 | 9 |
| 2007 | 7 | 8 |
| 2008 | 11 | 16 |
| 2009 | 11 | 12 |
| 2010 | 6 | 22 |
| 2011 | 9 | 15 |
| 2012 | 14 | 29 |
| 2013 | 29 | 34 |
| 2014 | 34 | 50 |
| 2015 | 31 | 45 |
| 2016 | 55 | 53 |
| 2017 | 44 | 42 |
| 2018 | 42 | 48 |
| 2019 | 47 | 33 |
| 2020 | 43 | 44 |
| 2021 | 31 | 30 |
| 2022 | 34 | 34 |
| 2023 | 29 | 41 |
| 2024 | 33 | 40 |
| 2025 | 29 | 52 |
| 2026 | 16 | 41 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Optical system and method for a radiation source6 Oct 2026US 12,757,311 B2ASML Netherlands B. V.
- System and method for monitoring and controlling extreme ultraviolet photolithography processes29 Sep 2026US 12,748,353 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Extreme ultraviolet light generation apparatus and electronic device manufacturing method29 Sep 2026US 12,750,939 B2Gigaphoton Inc.
- Assembly for a laser-operated light source and method of use15 Sep 2026US 12,736,884 B2ASML Netherlands B. V.
- EUV light generation system and electronic device manufacturing method1 Sep 2026US 12,727,072 B2Gigaphoton Inc.
- Optical system, method of use, and method of fabrication1 Oct 2026US 2026/0299429 A1xLight Inc.
- Laser synchronization with target motion for euv source optimization1 Oct 2026US 2026/0304584 A1KLA Corporation
- Semiconductor system inspection tool and methods of operation1 Oct 2026US 2026/0304585 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Euv radiation source and position-controllable mirror3 Sep 2026US 2026/0262156 A1ASML Netherlands B. V.
- Debris catcher, rotating target extreme ultraviolet (euv) radiation generation system, method of generating euv radiation, method of inspecting photomask, method of manufacturing semiconductor device27 Aug 2026US 2026/0251986 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Extreme ultraviolet light source88US 6,972,421 B2Cymer, Inc. · 2005
- EUV light source80US 7,164,144 B2Cymer, Inc. · 2007
- High repetition rate laser produced plasma EUV light source70US 7,087,914 B2Cymer, Inc. · 2006
- Drive laser delivery systems for EUV light source61US 7,491,954 B2Cymer, Inc. · 2009
- LPP EUV light source drive laser system57US 7,439,530 B2Cymer, Inc. · 2008