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US 7,439,530 B2Granted
LPP EUV light source drive laser system
AssigneeCymer, Inc.
InventorsAlexander I. Ershov, Alexander N. Bykanov, Oleh Khodykin, Igor V. Fomenkov
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AssigneeCymer, Inc.
InventorsAlexander I. Ershov, Alexander N. Bykanov, Oleh Khodykin, Igor V. Fomenkov
Estimating the term…
An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy if not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.
A laser produced plasma EUV system comprising:
The apparatus of 18 further comprising:
The apparatus of 18 further comprising:
A laser produced plasma EUV light source comprising:
The apparatus of 33 further comprising:
A laser produced plasma EUV light source comprising:
Dependencies are inferred from the claim text.