Drive laser delivery systems for EUV light source
AssigneeCymer, Inc.
InventorsAlexander N. Bykanov, Igor V. Fomenkov, Oleh Khodykin, Alexander I. Ershov
Life of this patent
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AssigneeCymer, Inc.
InventorsAlexander N. Bykanov, Igor V. Fomenkov, Oleh Khodykin, Alexander I. Ershov
Estimating the term…
An LPP EUV light source is disclosed having an optic positioned in the plasma chamber for reflecting EUV light generated therein and a laser input window. For this aspect, the EUV light source may be configured to expose the optic to a gaseous etchant pressure for optic cleaning while the window is exposed to a lower gaseous etchant pressure to avoid window coating deterioration. In another aspect, an EUV light source may comprise a target material positionable along a beam path to participate in a first interaction with light on the beam path; an optical amplifier; and at least one optic directing photons scattered from the first interaction into the optical amplifier to produce a laser beam on the beam path for a subsequent interaction with the target material to produce an EUV light emitting plasma.
An EUV light source comprising;
An EUV light source comprising;
An EUV light source comprising;
An EUV light source comprising:
An EUV light source comprising:
An EUV light source comprising:
Dependencies are inferred from the claim text.