Euv radiation source and position-controllable mirror
AssigneeASML Netherlands B.V.
InventorsRobert Rens WAIBOER, Dieter Emmanuel LAMBREGTS, Jordy NIEUWHOFF, Jasper WINTERS, Albert DEKKER, Kodai HATAKEYAMA, Robert Jan VOORHOEVE, Robert Max EGERMAN
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Abstract
An EUV radiation source comprising a laser configured to emit a laser beam, and an optical system configured to control a position of the laser beam such that it is incident upon fuel droplets, wherein the optical system comprises an optical path which includes a position-controllable mirror having a control bandwidth of at least 500 Hz.
Claims20
1-19. (canceled)
An EUV radiation source comprising:
- a laser configured to emit a laser beam, and
- an optical system configured to control a position of the laser beam such that it is incident upon fuel droplets,
- wherein the optical system comprises an optical path which includes a position-controllable mirror having a control bandwidth of at least 500 Hz.
A position-controllable mirror for use in an EUV radiation source, wherein the position-controllable mirror has a control bandwidth of at least 500 Hz.
A method of directing a laser beam onto a fuel droplet in an EUV radiation source, wherein the method comprises:
- controlling the position of the laser beam using a position-controllable mirror having a control bandwidth of at least 500 Hz.
Dependencies are inferred from the claim text.