H05G 2/007
Involving electric or magnetic fields in the process of plasma generation
Official title: {involving electric or magnetic fields in the process of plasma generation}
H05G2/007 (Involving electric or magnetic fields in the process of plasma generation) appears on 118 US grants and 100 published applications in this corpus.
Search patents in H05G- Granted patents
- 118
- Published applications
- 100
- Assignees
- 58
- Inventors
- 240
- Latest grant
- 30 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 5 | 0 |
| 1986 | 2 | 0 |
| 1987 | 2 | 0 |
| 1988 | 2 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 2 | 0 |
| 1995 | 1 | 0 |
| 1996 | 2 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 4 | 0 |
| 2001 | 2 | 2 |
| 2002 | 4 | 5 |
| 2003 | 5 | 4 |
| 2004 | 5 | 3 |
| 2005 | 2 | 2 |
| 2006 | 3 | 10 |
| 2007 | 5 | 5 |
| 2008 | 6 | 11 |
| 2009 | 4 | 4 |
| 2010 | 7 | 7 |
| 2011 | 3 | 6 |
| 2012 | 4 | 4 |
| 2013 | 9 | 2 |
| 2014 | 3 | 3 |
| 2015 | 1 | 4 |
| 2016 | 6 | 5 |
| 2017 | 6 | 3 |
| 2018 | 3 | 0 |
| 2019 | 2 | 2 |
| 2020 | 3 | 4 |
| 2021 | 3 | 5 |
| 2022 | 1 | 1 |
| 2023 | 4 | 2 |
| 2024 | 2 | 1 |
| 2025 | 1 | 4 |
| 2026 | 1 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Light source system and method of operation30 Jun 2026US 12,672,226 B2xLight Inc.
- Light source system and method of operation10 Jun 2025US 12,328,806 B2xLight Inc.
- Inductively coupled plasma light source10 Dec 2024US 12,165,856 B2Energetiq Technology, Inc.
- Mechanical alignment of x-ray sources15 Oct 2024US 12,120,807 B2Excillium AB
- Foil trap and light source apparatus including the same21 Nov 2023US 11,822,258 B2Ushio Denki Kabushiki Kaisha
- Lithographic apparatus, method of increasing plasma concentration, and method of manufacturing devices6 Aug 2026US 2026/0231313 A1ASML Netherlands B. V.
- Light source system and method of operation20 Mar 2025US 2025/0098056 A1xLight Inc.
- Inductively Coupled Plasma Light Source27 Feb 2025US 2025/0069870 A1Energetiq Technology, Inc.
- Light source system and method of operation13 Feb 2025US 2025/0055246 A1xLight Inc.
- Light source system and method of operation13 Feb 2025US 2025/0056704 A1xLight Inc.
Most cited
By later US patents
- Plasma focus high energy photon source93US 5,763,930 ACymer, Inc. · 1998
- Plasma focus high energy photon source91US 6,064,072 ACymer, Inc. · 2000
- Plasma focus light source with improved pulse power system89US 6,566,667 B1Cymer, Inc. · 2003
- Filter apparatus for use with an x-ray source88US 4,837,794 AMaxwell Laboratories, Inc. · 1989
- Extreme ultraviolet light source88US 6,972,421 B2Cymer, Inc. · 2005