H05G 2/009
Auxiliary arrangements not involved in the plasma generation
Official title: {Auxiliary arrangements not involved in the plasma generation}
H05G2/009 (Auxiliary arrangements not involved in the plasma generation) appears on 519 US grants and 598 published applications in this corpus.
Search patents in H05G- Granted patents
- 519
- Published applications
- 598
- Assignees
- 111
- Inventors
- 931
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 2 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 3 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 2 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 5 | 0 |
| 2002 | 4 | 8 |
| 2003 | 6 | 6 |
| 2004 | 5 | 14 |
| 2005 | 10 | 14 |
| 2006 | 13 | 24 |
| 2007 | 18 | 20 |
| 2008 | 16 | 21 |
| 2009 | 12 | 23 |
| 2010 | 20 | 28 |
| 2011 | 10 | 22 |
| 2012 | 20 | 26 |
| 2013 | 26 | 22 |
| 2014 | 32 | 22 |
| 2015 | 16 | 19 |
| 2016 | 23 | 39 |
| 2017 | 32 | 18 |
| 2018 | 28 | 19 |
| 2019 | 25 | 17 |
| 2020 | 30 | 51 |
| 2021 | 31 | 32 |
| 2022 | 34 | 35 |
| 2023 | 31 | 46 |
| 2024 | 21 | 26 |
| 2025 | 29 | 26 |
| 2026 | 8 | 20 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- High brightness LPP EUV light source with fast rotating target and method of cooling thereof6 Oct 2026US 12,757,310 B2Isteq Group Holding B.V.
- Extreme ultraviolet light source device6 Oct 2026US 12,757,312 B2Samsung Electronics Co., Ltd.
- Method and apparatus for mitigating tin debris25 Aug 2026US 12,717,238 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Apparatus for and method of reducing contamination from source material in an EUV light source18 Aug 2026US 12,713,511 B2ASML Netherlands B. V.
- Module vessel with scrubber gutters sized to prevent overflow16 Jun 2026US 12,656,697 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Optical system, method of use, and method of fabrication1 Oct 2026US 2026/0299429 A1xLight Inc.
- Debris trap unit and light source apparatus27 Aug 2026US 2026/0255465 A1Ushio Denki Kabushiki Kaisha
- X-ray analysis system with laser-driven source13 Aug 2026US 2026/0239520 A1Bruker Technologies Ltd.
- Euv utilization system and method16 Jul 2026US 2026/0206121 A1ASML Netherlands B. V.
- Light source apparatus and light emitting unit25 Jun 2026US 2026/0181763 A1Ushio Denki Kabushiki Kaisha
Most cited
By later US patents
- Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source260US 7,196,342 B2Cymer, Inc. · 2007
- Collector in an extreme ultraviolet lithography system with optimal air curtain protection151US 9,869,934 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2018
- Filter apparatus for use with an x-ray source88US 4,837,794 AMaxwell Laboratories, Inc. · 1989
- Extreme ultraviolet light source88US 6,972,421 B2Cymer, Inc. · 2005
- X-ray source77US 4,538,291 AKabushiki Kaisha Suwa Seikosha · 1985