H05G 2/0094
Reduction, prevention or protection from contamination
Official title: {Reduction, prevention or protection from contamination; Cleaning}
H05G2/0094 (Reduction, prevention or protection from contamination) appears on 315 US grants and 364 published applications in this corpus.
Search patents in H05G- Granted patents
- 315
- Published applications
- 364
- Assignees
- 64
- Inventors
- 582
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 3 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 2 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 2 | 0 |
| 2002 | 3 | 6 |
| 2003 | 3 | 3 |
| 2004 | 3 | 10 |
| 2005 | 9 | 11 |
| 2006 | 7 | 16 |
| 2007 | 14 | 12 |
| 2008 | 13 | 12 |
| 2009 | 4 | 14 |
| 2010 | 13 | 23 |
| 2011 | 8 | 14 |
| 2012 | 13 | 13 |
| 2013 | 14 | 12 |
| 2014 | 18 | 11 |
| 2015 | 10 | 10 |
| 2016 | 14 | 20 |
| 2017 | 17 | 8 |
| 2018 | 11 | 10 |
| 2019 | 14 | 10 |
| 2020 | 19 | 31 |
| 2021 | 18 | 15 |
| 2022 | 16 | 23 |
| 2023 | 23 | 32 |
| 2024 | 17 | 18 |
| 2025 | 19 | 17 |
| 2026 | 4 | 13 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method and apparatus for mitigating tin debris25 Aug 2026US 12,717,238 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Apparatus for and method of reducing contamination from source material in an EUV light source18 Aug 2026US 12,713,511 B2ASML Netherlands B. V.
- Module vessel with scrubber gutters sized to prevent overflow16 Jun 2026US 12,656,697 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Lithography contamination control31 Mar 2026US 12,591,182 B2Taiwan Semiconductor Manufacturing Company.Ltd
- EUV radiation source apparatus for lithography30 Dec 2025US 12,510,827 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Debris trap unit and light source apparatus27 Aug 2026US 2026/0255465 A1Ushio Denki Kabushiki Kaisha
- Euv utilization system and method16 Jul 2026US 2026/0206121 A1ASML Netherlands B. V.
- Light source apparatus and light emitting unit25 Jun 2026US 2026/0181763 A1Ushio Denki Kabushiki Kaisha
- Processing method of target supply device and electronic device manufacturing method14 May 2026US 2026/0136449 A1Gigaphoton Inc.
- Euv light generation apparatus and electronic device manufacturing method16 Apr 2026US 2026/0107367 A1Gigaphoton Inc.
Most cited
By later US patents
- Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source260US 7,196,342 B2Cymer, Inc. · 2007
- Filter apparatus for use with an x-ray source88US 4,837,794 AMaxwell Laboratories, Inc. · 1989
- Extreme ultraviolet light source88US 6,972,421 B2Cymer, Inc. · 2005
- Plasma focus high energy photon source with blast shield76US 6,452,199 B1Cymer, Inc. · 2002
- Plasma focus light source with active and buffer gas control75US 6,586,757 B2Cymer, Inc. · 2003