Lithography contamination control

An extreme ultraviolet light lithography system, comprising:

• a processor;
• an extreme ultraviolet light source including:
• a droplet generator configured to generate a droplet;
• a collector configured to reflect extreme ultraviolet light into an intermediate focus point;
• and
• a light generator configured to generate pre-pulse light and main pulse light, wherein the droplet generator generates the extreme ultraviolet light in response to the droplet being illuminated with the pre-pulse light and the main pulse light;
• a scanner including:
• a mask stage;
• and
• a substrate table;
• a hollow connection member including a first end and a second end opposite the first end, the hollow connection member is between the extreme ultraviolet light source and the scanner, and wherein the hollow connection member includes a first hollow space in which the intermediate focus point is disposed;
• and
• a gas channel member that is annular and received by the second end of the hollow connection member, the gas channel member includes an inner wall, an outer wall, and a plurality of suction arms that extend inward from the inner wall and extend away from the outer wall, the plurality of suction arms are in fluid communication with an exhaust pump through a gas channel of the gas channel member between and delimited by the inner wall and the outer wall of the gas channel member, and wherein the gas channel member includes a second hollow space into which the plurality of suction arms extend from the inner wall.