H01J 2237/31732
Depositing thin layers on selected microareas
H01J2237/31732 (Depositing thin layers on selected microareas) appears on 147 US grants and 152 published applications in this corpus.
Search patents in H01J- Granted patents
- 147
- Published applications
- 152
- Assignees
- 75
- Inventors
- 310
- Latest grant
- 21 Oct 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 6 | 0 |
| 1997 | 4 | 0 |
| 1998 | 4 | 0 |
| 1999 | 2 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 1 |
| 2002 | 0 | 0 |
| 2003 | 1 | 2 |
| 2004 | 1 | 5 |
| 2005 | 3 | 7 |
| 2006 | 4 | 10 |
| 2007 | 5 | 16 |
| 2008 | 11 | 13 |
| 2009 | 11 | 11 |
| 2010 | 8 | 9 |
| 2011 | 9 | 10 |
| 2012 | 4 | 5 |
| 2013 | 10 | 5 |
| 2014 | 10 | 6 |
| 2015 | 4 | 7 |
| 2016 | 5 | 6 |
| 2017 | 8 | 8 |
| 2018 | 4 | 3 |
| 2019 | 8 | 1 |
| 2020 | 5 | 7 |
| 2021 | 3 | 3 |
| 2022 | 3 | 4 |
| 2023 | 2 | 5 |
| 2024 | 5 | 2 |
| 2025 | 3 | 1 |
| 2026 | 0 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Method of forming a multipole device, method of influencing an electron beam, and multipole device21 Oct 2025US 12,451,322 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Method and apparatus for forming a patterned layer of material26 Aug 2025US 12,399,428 B2ASML Netherlands B. V.
- Temperature-controlled surface with a cryo-nanomanipulator for improved deposition rate18 Feb 2025US 12,230,473 B2Applied Materials Israel Ltd.
- 3D nanoprinter24 Dec 2024US 12,174,542 B2Sivananthan Laboratories, Inc.
- Sample stand and method for manufacturing sample stand17 Sep 2024US 12,090,624 B2Kioxia Corporation
- Focused charged particle beam device with a precursor source, and method for processing or imaging samples30 Jul 2026US 2026/0221380 A1Tescan Group A.S.
- Method and device for correcting an imaging error of a particle beam during sample processing23 Jul 2026US 2026/0213126 A1
- Charged particle beam device and method for controlling charged particle beam device18 Jun 2026US 2026/0171354 A1Hitachi High-Tech Science Corporation
- Lamella hole trench fill method14 May 2026US 2026/0135062 A1FEI Company
- Method for depositing a coating in process chambers26 Feb 2026US 2026/0058094 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Processing method and apparatus using focused ion beam generating means79US 5,825,035 AHitachi, Ltd. · 1998
- Process and device for surface-modification by physico-chemical reactions of gases or vapors on surfaces, using highly-charged ions67US 5,645,897 A1997
- Ion and charged particle source for production of thin films62US 6,878,930 B12005
- Self-masking FIB milling54US 5,616,921 ASchlumberger Technologies, Inc. · 1997
- Focused ion beam system with coaxial scanning electron microscope53US 6,900,447 B2FEI Company · 2005