Focused ion beam system with coaxial scanning electron microscope

An apparatus including an ion beam column and an electron beam column, comprising:

• a source of a primary electron beam;
• an ion optical column including an ion beam generating source, said ion optical column having an optical axis;
• a detector for detecting secondary particles generated by the electron beam or the ion beam striking the work piece;
• a deflector for deflecting the primary electron beam to travel substantially along the ion column optical axis toward the work piece and for deflecting the secondary particles toward the detector;
• and
• a final, non-unipotential electrostatic lens that focuses both the primary electron beam and the ion beam onto a work piece and that draws secondary particles through the lens in the opposite direction of the primary electron beam.

A method for imaging and processing a work piece using an electron beam and an ion beam, the method comprising:

• generating a focused ion beam including ions traveling along an ion column optical axis toward a work piece;
• generating an electron beam including electrons traveling in direction different from the ion column optical axis;
• deflecting the electron beam to be approximately co-axial with the ion beam;
• focusing the electron beam and the ion beam onto a work piece using a single final lens;
• accelerating back along the optical axis secondary particles generated when the focused ion beam or the beam of electrons strikes the work piece;
• and
• deflecting the secondary electrons toward an electron detector.

A method for imaging and processing a work piece using an electron beam and an ion beam, the method comprising:

• generating a focused ion beam including ions traveling along an ion column optical axis toward a work piece;
• generating from an electron source an electron beam including electrons traveling in direction different from the ion column optical axis;
• deflecting the electron beam to be approximately co-axial with the ion beam;
• and
• focusing the electron beam and the ion beam onto a work piece using a single, non-unipotential final lens.