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AssigneeHitachi High-Tech Science Corporation
InventorsShota TORIKAWA, Tatsuya ASAHATA, Haruyuki ISHII, Masahiro KIYOHARA, Atsushi UEMOTO
Estimating the term…
This charged particle beam device, which is for etching a sample, comprises: a charged particle beam-emitting optical system that emits a charged particle beam; a sample stage that holds a sample; a drive mechanism that drives the sample stage; a gas supply unit that supplies etching gas to the surface of the sample; and a computer that sets a processing region of the sample and controls the charged particle beam-emitting optical system and the drive mechanism so as to irradiate the set processing region with the charged particle beam and etch the sample. The computer sets a processing region on the sample that differs for each scan. The computer sets a different processing region for each scan on the sample.
A charged particle beam device performing deposition processing or etching processing on a sample, the charged particle beam device comprising:
A method of controlling a charged particle beam device that performs deposition processing or etching processing on a sample and comprises a charged particle beam-emitting optical system that irradiates a charged particle beam, a sample stage that holds a sample, a drive mechanism that drives the sample stage, a gas supply unit that supplies etching gas to a surface of the sample, and a computer that sets a processing region of the sample, the method comprising:
Dependencies are inferred from the claim text.