Method for depositing a coating in process chambers
AssigneeApplied Materials, Inc.
InventorsJoseph Behnke, Vahid Firouzdor, Jonathan Strahle, Christopher Beaudry
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Abstract
A method of coating an article for a process chamber is provided. The method includes performing an ion assisted deposition (IAD) using a dual source include a first source and a second source to deposit a protective layer on at least one surface of the article. The first source includes a metal oxide and the second source includes a metal fluoride. When the IAD is performed, a ratio of the metal oxide to the metal fluoride is controlled, such that a gradient in fluoride content between a bottom of the protective layer and the top of the protective layer occurs.
Claims20
A method comprising:
- performing an ion assisted deposition (IAD) using a dual source comprising a first source and a second source to deposit a protective layer on at least one surface of an article, wherein the first source comprises a metal oxide and the second source comprises a metal fluoride, and wherein performing the IAD comprises controlling a ratio of the metal oxide to the metal fluoride that is deposited;
- and
- adjusting the ratio of the metal oxide to the metal fluoride during the IAD to cause a first fluoride content at a bottom of the protective layer, a higher second fluoride content at a top of the protective layer, and a gradient in fluoride content between the bottom of the protective layer and the top of the protective layer.
A method comprising:
- performing an ion assisted deposited (IAD) using a dual source comprising a first source and a second source to deposit a protective layer on at least one surface of an article, wherein the first source comprises a first metal and the second source comprises a second metal, and wherein performing the IAD comprises controlling a ratio of the first metal to the second metal that is deposited;
- and
- adjusting the ratio of the first metal to the second metal during the IAD to cause a gradient in metal content between a bottom of the protective layer and the top of the protective layer.
A chamber component comprising:
- a body;
- a protective layer on a surface of the body comprising a first fluoride content at a bottom of the protective layer and a higher second fluoride content at a top of the protective layer, and a gradient in fluoride content between the bottom of the protective layer and the top of the protective layer, wherein the protective layer is deposited using an ion assisted deposition (IAD) using a dual source comprising a first source and a second source.
Dependencies are inferred from the claim text.