H01J 2237/12
Electrostatic
Official title: electrostatic
H01J2237/12 (Electrostatic) appears on 328 US grants and 379 published applications in this corpus.
Search patents in H01J- Granted patents
- 328
- Published applications
- 379
- Assignees
- 104
- Inventors
- 578
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 3 | 0 |
| 1993 | 2 | 0 |
| 1994 | 1 | 0 |
| 1995 | 2 | 0 |
| 1996 | 3 | 0 |
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 0 | 0 |
| 2000 | 3 | 0 |
| 2001 | 4 | 7 |
| 2002 | 2 | 5 |
| 2003 | 4 | 5 |
| 2004 | 4 | 9 |
| 2005 | 14 | 12 |
| 2006 | 12 | 14 |
| 2007 | 6 | 6 |
| 2008 | 13 | 12 |
| 2009 | 9 | 11 |
| 2010 | 4 | 8 |
| 2011 | 8 | 13 |
| 2012 | 10 | 10 |
| 2013 | 10 | 20 |
| 2014 | 22 | 20 |
| 2015 | 19 | 21 |
| 2016 | 17 | 23 |
| 2017 | 18 | 18 |
| 2018 | 18 | 11 |
| 2019 | 8 | 15 |
| 2020 | 21 | 24 |
| 2021 | 19 | 16 |
| 2022 | 12 | 14 |
| 2023 | 14 | 28 |
| 2024 | 9 | 22 |
| 2025 | 16 | 19 |
| 2026 | 15 | 16 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Assessment system, method of assessing6 Oct 2026US 12,755,929 B2ASML Netherlands B. V.
- Detector substrate for use in a charged particle multi-beam assessment tool11 Aug 2026US 12,706,272 B2ASML Netherlands B. V.
- Manipulator, manipulator array, charged particle tool, multi-beam charged particle tool, and method of manipulating a charged particle beam4 Aug 2026US 12,700,561 B2ASML Netherlands B. V.
- Objective lens array assembly, electron-optical system, electron-optical system array, method of focusing4 Aug 2026US 12,700,566 B2ASML Netherlands B. V.
- Ion microscope14 Jul 2026US 12,683,113 B2National University of Singapore
- Rapid mode switching of charged-particle-beam devices13 Aug 2026US 2026/0237595 A1
- Vertically oriented implanter architecture for contactless backside substrate processing6 Aug 2026US 2026/0229445 A1
- Charged particle apparatus, method of projecting charged particles, method of assessing a sample23 Jul 2026US 2026/0213115 A1ASML Netherlands B. V.
- Nano-probe measurement system23 Jul 2026US 2026/0213120 A1Samsung Electronics Co., Ltd.
- Electron-optical element4 Jun 2026US 2026/0155274 A1ASML Netherlands B. V.
Most cited
By later US patents
- Apparatus for generating a plurality of beamlets112US 7,129,502 B2Mapper Lithography IP B.V. · 2006
- Multi-lens type electrostatic lens, electron beam exposure apparatus and charged beam applied apparatus using the lens, and device manufacturing method using these apparatuses92US 6,617,595 B1Canon Kabushiki Kaisha · 2003
- Pattern inspection apparatus and electron beam apparatus86US 5,557,105 AFujitsu Limited · 1996
- Ion beam lithography71US 4,985,634 AOesterreichische Investitionskredit Aktiengesellschaft and Ionen Mikrofabrications · 1991
- Maskless photon-electron spot-grid array printer64US 6,841,787 B2APPLIED Materials.Inc. · 2005