H01J 2237/1205
Microlenses
H01J2237/1205 (Microlenses) appears on 181 US grants and 227 published applications in this corpus.
Search patents in H01J- Granted patents
- 181
- Published applications
- 227
- Assignees
- 58
- Inventors
- 332
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 2 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 3 | 6 |
| 2002 | 2 | 4 |
| 2003 | 2 | 4 |
| 2004 | 3 | 3 |
| 2005 | 8 | 8 |
| 2006 | 8 | 10 |
| 2007 | 3 | 3 |
| 2008 | 10 | 7 |
| 2009 | 4 | 5 |
| 2010 | 1 | 5 |
| 2011 | 5 | 8 |
| 2012 | 7 | 7 |
| 2013 | 7 | 13 |
| 2014 | 13 | 14 |
| 2015 | 11 | 5 |
| 2016 | 3 | 9 |
| 2017 | 12 | 6 |
| 2018 | 5 | 6 |
| 2019 | 4 | 8 |
| 2020 | 11 | 14 |
| 2021 | 8 | 9 |
| 2022 | 6 | 10 |
| 2023 | 11 | 23 |
| 2024 | 8 | 16 |
| 2025 | 11 | 15 |
| 2026 | 10 | 9 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Assessment system, method of assessing6 Oct 2026US 12,755,929 B2ASML Netherlands B. V.
- Detector substrate for use in a charged particle multi-beam assessment tool11 Aug 2026US 12,706,272 B2ASML Netherlands B. V.
- Manipulator, manipulator array, charged particle tool, multi-beam charged particle tool, and method of manipulating a charged particle beam4 Aug 2026US 12,700,561 B2ASML Netherlands B. V.
- Objective lens array assembly, electron-optical system, electron-optical system array, method of focusing4 Aug 2026US 12,700,566 B2ASML Netherlands B. V.
- Beam manipulator in charged particle-beam exposure apparatus5 May 2026US 12,620,547 B2ASML Netherlands B. V.
- Rapid mode switching of charged-particle-beam devices13 Aug 2026US 2026/0237595 A1
- Charged particle apparatus, method of projecting charged particles, method of assessing a sample23 Jul 2026US 2026/0213115 A1ASML Netherlands B. V.
- Nano-probe measurement system23 Jul 2026US 2026/0213120 A1Samsung Electronics Co., Ltd.
- Charged particle assessment tool, inspection method28 May 2026US 2026/0148935 A1ASML Netherlands B. V.
- Charged particle assessment tool, inspection method9 Apr 2026US 2026/0100324 A1ASML Netherlands B. V.
Most cited
By later US patents
- Apparatus for generating a plurality of beamlets112US 7,129,502 B2Mapper Lithography IP B.V. · 2006
- Multi-lens type electrostatic lens, electron beam exposure apparatus and charged beam applied apparatus using the lens, and device manufacturing method using these apparatuses92US 6,617,595 B1Canon Kabushiki Kaisha · 2003
- Pattern inspection apparatus and electron beam apparatus86US 5,557,105 AFujitsu Limited · 1996
- Maskless photon-electron spot-grid array printer64US 6,841,787 B2APPLIED Materials.Inc. · 2005
- Compact, integrated electron beam imaging system63US 5,122,663 AInternational Business Machine Corporation · 1992