Charged particle apparatus, method of projecting charged particles, method of assessing a sample
AssigneeASML Netherlands B.V.
InventorsAndre Luis RODRIGUES MANSANO, Erwin SLOT, Richard Michel VAN LEEUWEN
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AssigneeASML Netherlands B.V.
InventorsAndre Luis RODRIGUES MANSANO, Erwin SLOT, Richard Michel VAN LEEUWEN
Estimating the term…
The present disclosure relates to a charged particular apparatus for projecting a multi-beam of charged particles toward a sample. In one arrangement, a sample support supports a sample. A charged particle-optical device projects beams of a multi-beam of the charged particles along a plurality of paths toward the sample. The device comprises a plurality of charged particle-optical elements that define an objective lens and in which are defined a plurality of apertures along the paths of the beams. At least two of the charged particle-optical elements are configured to be set at different potentials and at least one of the charged particle-optical elements is set at ground potential.
A charged particle apparatus for projecting a multi-beam of charged particles toward a sample, the apparatus comprising:
The apparatus of claim wherein the shielded charged particle-optical element is connected to the facing electrode via the first spacer element.
The apparatus of claim wherein the first spacer element contacts a major surface of the facing electrode on a side of the facing electrode closest to the sample and/or the first spacer element contacts the facing electrode on a peripheral minor surface of the facing electrode.
The apparatus of claim wherein the first spacer element is spaced apart from the facing electrode.
A method of projecting charged particles toward a sample, the method comprising:
Dependencies are inferred from the claim text.