Charged particle assessment tool, inspection method
AssigneeASML Netherlands B.V.
InventorMarco Jan-Jaco WIELAND
Life of this patent
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Abstract
A charged particle assessment tool includes: an objective lens configured to project a plurality of charged particle beams onto a sample, the objective lens having a sample-facing surface defining a plurality of beam apertures through which respective ones of the charged particle beams are emitted toward the sample; and a plurality of capture electrodes adjacent respective ones of the beam apertures and configured to capture charged particles emitted from the sample.
Claims21
-20. (canceled)
An optical element for a multi-charged beam projection system configured to project a plurality of charged particle beams onto a sample, the optical element comprising:
- an objective lens having a surface arranged to face a sample and defining a plurality of beam apertures through which respective ones of the charged particle beams are emitted toward the sample;
- and
- a plurality of capture electrodes, each electrode adjacent a respective one of the beam apertures and configured to capture charged particles emitted from the sample.
An optical element for a multi-charged beam projection system configured to project a plurality of charged particle beams onto a sample, the optical element comprising:
- an objective lens having a surface arranged to face a sample and defining a plurality of beam apertures through which respective ones of the charged particle beams are emitted toward the sample;
- and
- a plurality of sensor units, each sensor unit adjacent a respective one of the beam apertures and configured to capture charged particles emitted from the sample.
Dependencies are inferred from the claim text.