H01J 2237/1202
Associated circuits
H01J2237/1202 (Associated circuits) appears on 24 US grants and 28 published applications in this corpus.
Search patents in H01J- Granted patents
- 24
- Published applications
- 28
- Assignees
- 23
- Inventors
- 61
- Latest grant
- 4 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 1 |
| 2005 | 1 | 0 |
| 2006 | 0 | 1 |
| 2007 | 0 | 0 |
| 2008 | 1 | 0 |
| 2009 | 0 | 1 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 1 | 1 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 2 |
| 2016 | 1 | 0 |
| 2017 | 1 | 4 |
| 2018 | 4 | 0 |
| 2019 | 0 | 3 |
| 2020 | 5 | 5 |
| 2021 | 3 | 2 |
| 2022 | 1 | 1 |
| 2023 | 1 | 1 |
| 2024 | 0 | 1 |
| 2025 | 1 | 4 |
| 2026 | 1 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Manipulator, manipulator array, charged particle tool, multi-beam charged particle tool, and method of manipulating a charged particle beam4 Aug 2026US 12,700,561 B2ASML Netherlands B. V.
- Circuits for edge ring control in shaped dc pulsed plasma process device17 Jun 2025US 12,334,311 B2APPLIED Materials.Inc.
- Particle beam system for adjusting the current of individual particle beams24 Jan 2023US 11,562,880 B2Carl Zeiss MultiSEM GmbH
- Circuits for edge ring control in shaped DC pulsed plasma process device29 Mar 2022US 11,289,310 B2APPLIED Materials.Inc.
- Multi-beam charged particle system10 Aug 2021US 11,087,948 B2Carl Zeiss MultiSEM GmbH
- Electron-optical element4 Jun 2026US 2026/0155274 A1ASML Netherlands B. V.
- Multi-beam particle microscope with improved multi-beam generator for field curvature correction and multi-beam generator6 Nov 2025US 2025/0343025 A1
- Multipole lens and charged particle beam device17 Jul 2025US 2025/0232944 A1Hitachi High-Tech Corporation
- Optical system for a plurality of primary beamlets, charged particle multi-beam apparatus and method of focusing a plurality of primary beamlets12 Jun 2025US 2025/0191874 A1ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Charged particle apparatus and method9 Jan 2025US 2025/0014855 A1ASML Netherlands B. V.
Most cited
By later US patents
- Particle beam system35US 10,600,613 B2Carl Zeiss Microscopy GmbH · 2020
- Multi-beam charged particle system34US 10,741,355 B1Carl Zeiss MultiSEM GmbH · 2020
- Ion implanter and controlling method therefor15US 5,293,508 AMitsubishi Denki Kabushiki Kaisha · 1994
- Particle beam system8US 9,552,957 B2Carl Zeiss Microscopy GmbH · 2017
- Deflection array apparatus for multi-electron beam system4US 10,748,739 B2KLA-Tencor Corporation · 2020