Deflection array apparatus for multi-electron beam system
AssigneeKLA-Tencor Corporation
InventorsXinrong Jiang, Christopher Sears
Life of this patent
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Abstract
An optical characterization system utilizing a micro-lens array (MLA) is provided. The system may include an electron source and a MLA including a micro-deflection array (MDA). The MDA may include an insulator substrate and a plurality of hexapole electrostatic deflectors disposed on the insulator substrate. The MDA may further include a plurality of voltage connecting lines configured to electrically couple the plurality of hexapole electrostatic deflectors to one or more voltage sources. The MDA may be configured to split a primary electron beam from the electron source into a plurality of primary electron beamlets. The system may be configured to focus the plurality of primary electron beamlets at a wafer plane.
Claims36
A system, comprising:
- an electron source;
- a micro-lens array (MLA) configured to receive one or more primary electron beams from the electron source, the micro-lens array including a micro-deflection array (MDA) comprising a plurality of hexapole electrostatic deflectors configured to eliminate third-order deflection aberrations, wherein the micro-deflection array is configured to split the one or more primary electron beams into a plurality of primary electron beamlets;
- and
- projection optics configured to receive the plurality of primary electron beamlets and focus the plurality of primary electron beamlets onto a surface of a sample.
A micro-deflection array, comprising:
- an insulator substrate;
- a plurality of hexapole electrostatic deflectors disposed on the insulator substrate, wherein each hexapole electrostatic deflector of the plurality of hexapole electrostatic deflectors comprises six deflection plates configured to eliminate third-order deflection aberrations;
- and
- a plurality of voltage connecting lines disposed on the insulator substrate configured to electrically couple the plurality of hexapole electrostatic deflectors to one or more voltage sources via a plurality of connecting pins, wherein the one or more voltage sources are configured to apply one or more focusing voltages to each hexapole electrostatic deflector of the plurality of hexapole electrostatic deflectors.
A hexapole electrostatic deflector, comprising:
- six deflection plates configured to eliminate third-order deflection aberrations, the six deflection plates arranged about a radius R, the six deflection plates comprising a first deflection plate, a second deflection plate, a third deflection plate, a fourth deflection plate, a fifth deflection plate, and a sixth deflection plate;
- wherein the first deflection plate, the third deflection plate, and the fifth deflection plate are applied with a first focusing voltage, and wherein the second deflection plate, the fourth deflection plate, and the sixth deflection plate are applied with a second focusing voltage.
Dependencies are inferred from the claim text.