H01J 2237/1207
Einzel lenses
H01J2237/1207 (Einzel lenses) appears on 28 US grants and 34 published applications in this corpus.
Search patents in H01J- Granted patents
- 28
- Published applications
- 34
- Assignees
- 22
- Inventors
- 70
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 1 |
| 2006 | 0 | 0 |
| 2007 | 1 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 1 |
| 2010 | 0 | 1 |
| 2011 | 1 | 1 |
| 2012 | 0 | 0 |
| 2013 | 1 | 0 |
| 2014 | 1 | 5 |
| 2015 | 0 | 1 |
| 2016 | 1 | 1 |
| 2017 | 1 | 2 |
| 2018 | 0 | 2 |
| 2019 | 1 | 0 |
| 2020 | 1 | 4 |
| 2021 | 3 | 1 |
| 2022 | 3 | 1 |
| 2023 | 2 | 4 |
| 2024 | 1 | 4 |
| 2025 | 1 | 2 |
| 2026 | 3 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Assessment system, method of assessing6 Oct 2026US 12,755,929 B2ASML Netherlands B. V.
- Ion microscope14 Jul 2026US 12,683,113 B2National University of Singapore
- Hybrid apparatus, system and techniques for mass analyzed ion beam10 Mar 2026US 12,573,579 B2APPLIED Materials.Inc.
- Aberration correction in charged particle system12 Aug 2025US 12,387,903 B2ASML Netherlands B. V.
- Vacuum chamber arrangement for charged particle beam generator16 Apr 2024US 11,961,627 B2ASML Netherlands B. V.
- Vertically oriented implanter architecture for contactless backside substrate processing6 Aug 2026US 2026/0229445 A1
- Multi-beam particle beam system having an electrostatic booster lens, method for operating a multi-beam particle beam system, and associated computer program product28 May 2026US 2026/0148923 A1
- Modular optical bench assembly14 May 2026US 2026/0135059 A1
- Imaging thousands of electron beams during workpiece inspection3 Apr 2025US 2025/0112017 A1
- Charged particle apparatus and method9 Jan 2025US 2025/0014855 A1ASML Netherlands B. V.
Most cited
By later US patents
- Ion beam lithography71US 4,985,634 AOesterreichische Investitionskredit Aktiengesellschaft and Ionen Mikrofabrications · 1991
- Accelerator-decelerator electrostatic lens for variably focusing and mass resolving an ion beam in an ion implanter32US 5,780,863 AEaton Corporation · 1998
- Integrated sub-nanometer-scale electron beam systems17US 7,279,686 B2Biomed Solutions, LLC · 2007
- Electrostatic lens and method for producing the same15US 5,444,256 AKabushiki Kaisha Toshiba · 1995
- All electrostatic electron optical sub-system for variable electron beam spot shaping and method of operation10US 4,683,366 AControl Data Corporation · 1987