G03F 1/36
Masks having proximity correction features
Official title: Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
G03F1/36 (Masks having proximity correction features) appears on 2,653 US grants and 2,838 published applications in this corpus.
Search patents in G03F- Granted patents
- 2,653
- Published applications
- 2,838
- Assignees
- 358
- Inventors
- 3,511
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 5 | 0 |
| 1994 | 3 | 0 |
| 1995 | 5 | 0 |
| 1996 | 5 | 0 |
| 1997 | 15 | 0 |
| 1998 | 23 | 0 |
| 1999 | 27 | 0 |
| 2000 | 39 | 0 |
| 2001 | 48 | 15 |
| 2002 | 62 | 95 |
| 2003 | 85 | 106 |
| 2004 | 85 | 128 |
| 2005 | 79 | 171 |
| 2006 | 112 | 154 |
| 2007 | 82 | 158 |
| 2008 | 119 | 156 |
| 2009 | 141 | 179 |
| 2010 | 162 | 149 |
| 2011 | 144 | 106 |
| 2012 | 161 | 108 |
| 2013 | 144 | 116 |
| 2014 | 128 | 78 |
| 2015 | 97 | 108 |
| 2016 | 88 | 81 |
| 2017 | 73 | 88 |
| 2018 | 64 | 77 |
| 2019 | 109 | 108 |
| 2020 | 108 | 107 |
| 2021 | 107 | 103 |
| 2022 | 68 | 94 |
| 2023 | 90 | 115 |
| 2024 | 63 | 104 |
| 2025 | 70 | 79 |
| 2026 | 39 | 55 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Mask optimization for layer accounting for overlap with other layers6 Oct 2026US 12,754,471 B2D2S, Inc.
- Mask optimization for layer based on comparison of components in layer to components in other layers6 Oct 2026US 12,754,472 B2D2S, Inc.
- Mask optimization preferentially accounting for overlap regions6 Oct 2026US 12,754,473 B2D2S, Inc.
- Concurrent mask optimization for multiple layers6 Oct 2026US 12,754,474 B2D2S, Inc.
- Mask for stitching exposure15 Sep 2026US 12,736,869 B2Korea Advanced Institute of Science and Technology
- Method of and device for generating layout diagram8 Oct 2026US 2026/0310062 A1Taiwan Semiconductor Manufacturing Company.Ltd
- System and method for 3d mask model based on huygens-fresnel principle8 Oct 2026US 2026/0310063 A1Samsung Electronics Co., Ltd.
- Kernel function generation method, optical proximity correction method using the kernel function, and mask manufacturing method including the optical proximity correction method8 Oct 2026US 2026/0310064 A1Samsung Electronics Co., Ltd.
- Method and system for training a prediction model to generate a two-dimensional-element representation of a mask pattern8 Oct 2026US 2026/0310065 A1ASML Netherlands B. V.
- Mask optimization accounting for more critical and less critical overlap regions8 Oct 2026US 2026/0310067 A1D2S, Inc.
Most cited
By later US patents
- Method for integrated circuit mask patterning449US 9,256,709 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2016
- Method of generating a bias-adjusted layout design of a conductive feature and method of generating a simulation model of a predefined fabrication process418US 8,887,106 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Design rule checking system and method400US 6,470,489 B1Numerical Technologies, Inc. · 2002
- Method utilizing compensation features in semiconductor processing379US 7,202,148 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2007
- Phase shifting circuit manufacture method and apparatus356US 5,858,580 ANumerical Technologies, Inc. · 1999