C30B 25/105
By irradiation or electric discharge
Official title: {by irradiation or electric discharge}
C30B25/105 (By irradiation or electric discharge) appears on 557 US grants and 517 published applications in this corpus.
Search patents in C30B- Granted patents
- 557
- Published applications
- 517
- Assignees
- 288
- Inventors
- 1,312
- Latest grant
- 4 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 2 | 0 |
| 1984 | 4 | 0 |
| 1985 | 6 | 0 |
| 1986 | 3 | 0 |
| 1987 | 2 | 0 |
| 1988 | 5 | 0 |
| 1989 | 11 | 0 |
| 1990 | 11 | 0 |
| 1991 | 11 | 0 |
| 1992 | 12 | 0 |
| 1993 | 15 | 0 |
| 1994 | 17 | 0 |
| 1995 | 11 | 0 |
| 1996 | 10 | 0 |
| 1997 | 16 | 0 |
| 1998 | 29 | 0 |
| 1999 | 15 | 0 |
| 2000 | 25 | 0 |
| 2001 | 12 | 3 |
| 2002 | 15 | 15 |
| 2003 | 10 | 25 |
| 2004 | 10 | 24 |
| 2005 | 18 | 39 |
| 2006 | 20 | 26 |
| 2007 | 14 | 28 |
| 2008 | 15 | 22 |
| 2009 | 11 | 26 |
| 2010 | 16 | 33 |
| 2011 | 13 | 15 |
| 2012 | 20 | 21 |
| 2013 | 14 | 16 |
| 2014 | 21 | 23 |
| 2015 | 16 | 23 |
| 2016 | 13 | 19 |
| 2017 | 10 | 16 |
| 2018 | 18 | 16 |
| 2019 | 15 | 11 |
| 2020 | 10 | 5 |
| 2021 | 5 | 17 |
| 2022 | 11 | 12 |
| 2023 | 7 | 14 |
| 2024 | 13 | 28 |
| 2025 | 10 | 18 |
| 2026 | 11 | 22 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Highly reflective metallic alloys for components of semiconductor processing equipment, and related methods4 Aug 2026US 12,698,570 B2APPLIED Materials.Inc.
- Crystalline wafers and process for forming crystalline wafers28 Jul 2026US 12,696,692 B2II-Vi Advanced Materials, LLC
- Components and apparatus for improving uniformity of an epitaxial layer16 Jun 2026US 12,660,560 B2APPLIED Materials.Inc.
- Deposition equipment with adjustable temperature source14 Apr 2026US 12,604,679 B2Taiwan Semiconductor Manufacturing Company.Ltd
- System and methods for a radiant heat cap in a semiconductor wafer reactor17 Mar 2026US 12,581,571 B2GlobalWafers Co., Ltd.
- Systems, methods, and computer program products for substrate processing1 Oct 2026US 2026/0297804 A1ASM IP Holding B. V.
- Method for the controlled deposition of an oxide layer of a target oxide on a substrate in a tle system, and tle system24 Sep 2026US 2026/0286568 A1Max-Planck-Gesellschaft Zur FöRderung Der Wissenschaften E. V.
- Diamond wafer fabrication by heteroepitaxy deposition20 Aug 2026US 2026/0242978 A1
- Method for heteroepitaxial deposition of diamond and wafer produced thereby20 Aug 2026US 2026/0247675 A1Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V.
- Nanofabricated patterned mesoscopic circuits on diamond anvils13 Aug 2026US 2026/0234785 A1Washington University
Most cited
By later US patents
- Rapid thermal processing apparatus for processing semiconductor wafers624US 5,444,217 AMoore Epitaxial, Inc. · 1995
- Remote plasma enhanced CVD method and apparatus for growing an epitaxial semiconductor layer585US 5,180,435 AResearch Triangle Institute · 1993
- Method and apparatus for achieving spatially uniform externally excited non-thermal chemical reactions554US 4,401,507 AAdvanced Semiconductor Materials/AM. · 1983
- Process and apparatus for the production of diamond490US 5,314,570 ASumitomo Electric Industries, Ltd. · 1994
- Method for increasing the batch size of a barrel epitaxial reactor and reactor produced thereby475US 5,053,247 AMoore Epitaxial, Inc. · 1991