Components and apparatus for improving uniformity of an epitaxial layer
AssigneeApplied Materials, Inc.
InventorsThomas Ackermann, Laura Esposito, Emir Sabanovic
Life of this patent
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Abstract
Disclosed herein are a shaft for supporting a susceptor within an epitaxial growth apparatus, and an epitaxial growth apparatus having the same. In one example, the shaft for supporting a susceptor within an epitaxial growth apparatus includes a support column, a post, and a plurality of arms. The post is coupled with a support column. The post includes an infrared transmission reducing portion disposed proximately to the susceptor and having a lower transmissivity of infrared radiation than the support column. The plurality of arms extend radially from the support column and are configured to support the susceptor.
Claims19
A shaft for supporting a susceptor within an epitaxial growth apparatus, the shaft comprising:
- an infrared transmissive support column;
- a post formed from opaque quartz coaxially coupled with the support column, the post comprising an infrared radiation reducing portion having a lower transmissivity of infrared radiation than the support column, and wherein the thermal expansion coefficient of the post is the same as the support column;
- and
- a plurality of arms extending radially from the support column and configured to support the susceptor.
An epitaxial growth apparatus comprising:
- a chamber;
- a susceptor configured to support a semiconductor substrate within the chamber;
- an inner shaft configured to support the susceptor, wherein the inner shaft comprises:
- an infrared transmissive support column;
- a post formed from opaque quartz coaxially coupled with the support column, the post comprising an infrared radiation reducing portion having a lower transmissivity of infrared radiation than the support column, and wherein the thermal expansion coefficient of the post is the same as the support column;
- and
- a plurality of arms extending radially from the support column and configured to support the susceptor, and
- a plurality of heating units that heat the susceptor and the semiconductor substrate.
Dependencies are inferred from the claim text.