Highly reflective metallic alloys for components of semiconductor processing equipment, and related methods

A processing chamber applicable for use in semiconductor manufacturing, comprising:

• a chamber body having an internal volume;
• one or more heat sources configured to provide heat to the internal volume;
• a substrate support disposed in the internal volume, the substrate support comprising a support surface;
• an upper window disposed over the substrate support;
• a lower window disposed below the substrate support;
• one or more chamber components positioned to reflect energy emitted from the one or more heat sources through at least one of the upper window or the lower window and into the internal volume, the one or more chamber components comprising an aluminum alloy and one or more reflective surfaces having a surface roughness (Ra) that is 5.0 nanometer or less,
• wherein:
• the aluminum alloy comprises aluminum and one or more transition metals,
• the aluminum alloy comprises an alloy composition having at least 80% aluminum atomic percentage and at least 5% transition atomic percentage of the one or more transition metals, and
• a sum of the aluminum atomic percentage and the transition atomic percentage is at least 95%.