C23C 16/448
Characterised by the method used for generating reactive gas streams
Official title: characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
C23C16/448 (Characterised by the method used for generating reactive gas streams) appears on 2,588 US grants and 3,139 published applications in this corpus.
Search patents in C23C- Granted patents
- 2,588
- Published applications
- 3,139
- Assignees
- 970
- Inventors
- 5,954
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 3 | 0 |
| 1979 | 2 | 0 |
| 1980 | 4 | 0 |
| 1981 | 6 | 0 |
| 1982 | 4 | 0 |
| 1983 | 1 | 0 |
| 1984 | 2 | 0 |
| 1985 | 8 | 0 |
| 1986 | 12 | 0 |
| 1987 | 8 | 0 |
| 1988 | 14 | 0 |
| 1989 | 30 | 0 |
| 1990 | 38 | 0 |
| 1991 | 20 | 0 |
| 1992 | 33 | 0 |
| 1993 | 35 | 0 |
| 1994 | 38 | 0 |
| 1995 | 48 | 0 |
| 1996 | 53 | 0 |
| 1997 | 46 | 0 |
| 1998 | 57 | 0 |
| 1999 | 76 | 0 |
| 2000 | 93 | 0 |
| 2001 | 96 | 45 |
| 2002 | 76 | 100 |
| 2003 | 76 | 109 |
| 2004 | 64 | 83 |
| 2005 | 47 | 106 |
| 2006 | 52 | 120 |
| 2007 | 34 | 105 |
| 2008 | 46 | 103 |
| 2009 | 49 | 135 |
| 2010 | 61 | 101 |
| 2011 | 63 | 115 |
| 2012 | 69 | 85 |
| 2013 | 77 | 104 |
| 2014 | 59 | 126 |
| 2015 | 70 | 121 |
| 2016 | 66 | 118 |
| 2017 | 63 | 122 |
| 2018 | 80 | 108 |
| 2019 | 94 | 125 |
| 2020 | 73 | 136 |
| 2021 | 88 | 144 |
| 2022 | 90 | 190 |
| 2023 | 119 | 183 |
| 2024 | 116 | 183 |
| 2025 | 139 | 151 |
| 2026 | 88 | 121 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- C23C 16/4481By evaporation using carrier gas in contact with the source material836
- C23C 16/452By activating reactive gas streams before their introduction into the reaction chamber801
- C23C 16/4486By producing an aerosol and subsequent evaporation of the droplets or particles312
- C23C 16/4485By evaporation without using carrier gas in contact with the source material308
- C23C 16/4488By in situ generation of reactive gas by chemical or electrochemical reaction212
- C23C 16/4487By using a condenser18
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Most cited
By later US patents
- Sequential chemical vapor deposition1,159US 5,916,365 A1999
- Method of forming graded thin films using alternating pulses of vapor phase reactants1,034US 6,534,395 B2ASM Microchemistry Oy · 2003
- Apparatus and method for growth of a thin film940US 6,511,539 B1ASM America, Inc. · 2003
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- Apparatus for growing thin films784US 5,855,680 ANeste Oy · 1999