C23C 16/4486
By producing an aerosol and subsequent evaporation of the droplets or particles
Official title: {by producing an aerosol and subsequent evaporation of the droplets or particles}
C23C16/4486 (By producing an aerosol and subsequent evaporation of the droplets or particles) appears on 312 US grants and 358 published applications in this corpus.
Search patents in C23C- Granted patents
- 312
- Published applications
- 358
- Assignees
- 183
- Inventors
- 755
- Latest grant
- 16 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 3 | 0 |
| 1992 | 4 | 0 |
| 1993 | 4 | 0 |
| 1994 | 8 | 0 |
| 1995 | 12 | 0 |
| 1996 | 7 | 0 |
| 1997 | 10 | 0 |
| 1998 | 11 | 0 |
| 1999 | 12 | 0 |
| 2000 | 12 | 0 |
| 2001 | 13 | 8 |
| 2002 | 11 | 21 |
| 2003 | 15 | 7 |
| 2004 | 7 | 9 |
| 2005 | 4 | 9 |
| 2006 | 1 | 15 |
| 2007 | 4 | 7 |
| 2008 | 9 | 8 |
| 2009 | 1 | 9 |
| 2010 | 6 | 12 |
| 2011 | 7 | 10 |
| 2012 | 4 | 9 |
| 2013 | 8 | 10 |
| 2014 | 7 | 11 |
| 2015 | 6 | 6 |
| 2016 | 4 | 12 |
| 2017 | 11 | 12 |
| 2018 | 12 | 18 |
| 2019 | 8 | 14 |
| 2020 | 8 | 21 |
| 2021 | 10 | 15 |
| 2022 | 11 | 27 |
| 2023 | 19 | 29 |
| 2024 | 10 | 28 |
| 2025 | 21 | 12 |
| 2026 | 9 | 19 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for producing laminate, producing apparatus for laminate, laminate, and semiconductor device16 Jun 2026US 12,660,520 B2Shin-Etsu Chemical Co., Ltd.
- Laminated structure and method for manufacturing laminated structure26 May 2026US 12,637,787 B2Shin-Etsu Chemical Co., Ltd.
- Method for producing a gallium oxide semiconductor film and a film forming apparatus14 Apr 2026US 12,601,054 B2Shin-Etsu Chemical Co., Ltd.
- Atomizing apparatus for film formation and film forming apparatus using the same17 Mar 2026US 12,576,420 B2Kochi Prefectural Public University Corporation
- Film formation method10 Mar 2026US 12,569,875 B2Flosfia Inc.
- Device and method for mist chemical vapor deposition of large-size semiconductor thin film8 Oct 2026US 2026/0308759 A1Tiangong University
- Heat exchanger for vaporizer for thin-film deposition17 Sep 2026US 2026/0275517 A1Ask Co.Ltd.
- Film-forming nozzle and film-forming apparatus13 Aug 2026US 2026/0234799 A1Shin-Etsu Chemical Co., Ltd.
- Metal oxide film, metal oxide multilayer, and method for producing metal oxide multilayer6 Aug 2026US 2026/0225900 A1Nof Corporation
- Nozzle cleaning method, crystalline oxide film formation method, and film formation apparatus6 Aug 2026US 2026/0226613 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Chemical vapor deposition of metal sulfide films from metal thiocarboxylate complexes with monodenate or multidentate ligands552US 5,837,320 AUniversity of New Mexico · 1998
- Method and apparatus for preparing integrated circuit thin films by chemical vapor deposition442US 6,110,531 ASymetrix Corporation · 2000
- Ferroelectric dielectric memory cell can switch at least giga cycles and has low fatigue - has high dielectric constant and low leakage current416US 5,519,234 ASymetrix Corporation · 1996
- Flowable gapfill using solvents346US 10,017,856 B1APPLIED Materials.Inc. · 2018
- Flash evaporation of monomer fluids323US 4,954,371 ASpectrum Control, Inc. · 1990