Metal oxide film, metal oxide multilayer, and method for producing metal oxide multilayer

Abstract

Provided is an amorphous metal oxide film, wherein the metal oxide film is represented by composition formula: SiaAlbOcTd (in the formula, Si is a silicon atom; Al is an aluminum atom; O is an oxygen atom; T is at least one atom other than Si, Al, and O; a, b, c, and d represent weight ratios; a+b+c+d=100; a is 3-45; b is 5-50; c is 35-60; and d is 0.05-10), and has a thickness of 0.1-30 μm. The metal oxide film can provide a metal oxide multilayer having excellent adhesion, heat dissipation, insulation, and high-voltage resistance.

Dependencies are inferred from the claim text.