Chemical vapor deposition of metal sulfide films from metal thiocarboxylate complexes with monodenate or multidentate ligands

A method of depositing a metal sulfide film on a substrate, said method comprising the steps of:

• preparing a solution containing at least one metal compound precursor comprising:
• a) at least one thiocarboxylate ligand SECR, wherein E is selected from the group consisting of O and S and wherein R is selected from the group consisting of alkyl, aryl, substituted alkyl, substituted aryl, halogenated alkyl, and halogenated aryl and
• b) at least one coordinated ligand L selected from the group consisting of monodentate ligands and multidentate ligands;
• heating the substrate to a reaction temperature;
• evaporating the solution to form vapors of said metal compound precursor;
• and
• contacting the vapors and the substrate heated to said reaction temperature, said reaction temperature sufficient to decompose said metal compound precursor to form said metal sulfide film of at least one metal M on the substrate.