Liquid vaporizer

A method comprising:

• vaporizing a reactant in a vaporizer to form a reactant vapor, wherein the vaporizer is disposed in a first thermal zone at a first temperature;
• transferring the reactant vapor through a filter downstream of the vaporizer;
• transferring the reactant vapor through a first valve to a process control chamber, wherein the process control chamber comprises a chamber having a volume configured to maintain the reactant vapor in vapor form, wherein the filter is between the vaporizer and the process control chamber;
• one of stepping down or stepping up, by a control system, a reactant vapor pressure upstream of the process control chamber;
• modulating, by a second control circuit of the control system, a pressure in the process control chamber using closed loop control based at least in part on feedback of measured pressure in the process control chamber and the second temperature of the process control chamber;
• maintaining, by a first control circuit of the control system, a pressure in the vaporizer using closed loop control based at least in part on feedback of measured pressure in the vaporizer and the first temperature;
• flowing the reactant vapor from the process control chamber through a second valve to a reactor, wherein the process control chamber is coupled upstream from the reactor, and wherein the reactor is in fluid communication with the vaporizer;
• and
• maintaining a second thermal zone to a second temperature greater than the first temperature, wherein the second thermal zone comprises the filter, the first valve, the process control chamber, the second valve, and supply lines connecting the filter to the second valve.

A processing method, comprising:

• maintaining a vaporizer at a first temperature;
• vaporizing a reactant in the vaporizer to form a reactant vapor;
• measuring a pressure in the vaporizer;
• maintaining using closed loop control, by a first control circuit of a control system, a pressure in the vaporizer at or below a dew point pressure of the reactant vapor, based at least in part on the first temperature of the vaporizer and the measured pressure in the vaporizer;
• maintaining a process control chamber at a second temperature that is greater than the first temperature in a range of 5° C. to 50° C., wherein the process control chamber is downstream of the vaporizer and comprises a chamber having a volume configured to maintain the reactant vapor in vapor form;
• transferring the reactant vapor through a filter downstream of the vaporizer, wherein the filter is between the vaporizer and the process control chamber, wherein the filter is maintained at the second temperature;
• one of stepping down or stepping up, by the control system, the reactant vapor pressure upstream of the process control chamber;
• transferring the reactant vapor to the process control chamber;
• measuring a pressure in the process control chamber;
• modulating, by a second control circuit of the control system, a pressure in the process control chamber using closed loop control based at least in part on the second temperature of the process control chamber and the measured pressure in the process control chamber;
• and
• flowing the reactant vapor from the process control chamber to a reactor, wherein the process control chamber is coupled upstream from the reactor, and wherein the reactor is in fluid communication with the vaporizer.