C23C 16/4488
By in situ generation of reactive gas by chemical or electrochemical reaction
Official title: {by in situ generation of reactive gas by chemical or electrochemical reaction}
C23C16/4488 (By in situ generation of reactive gas by chemical or electrochemical reaction) appears on 212 US grants and 310 published applications in this corpus.
Search patents in C23C- Granted patents
- 212
- Published applications
- 310
- Assignees
- 184
- Inventors
- 684
- Latest grant
- 12 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 3 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 2 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 2 | 0 |
| 1987 | 2 | 0 |
| 1988 | 3 | 0 |
| 1989 | 3 | 0 |
| 1990 | 5 | 0 |
| 1991 | 2 | 0 |
| 1992 | 6 | 0 |
| 1993 | 2 | 0 |
| 1994 | 0 | 0 |
| 1995 | 2 | 0 |
| 1996 | 3 | 0 |
| 1997 | 3 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 4 | 0 |
| 2001 | 3 | 0 |
| 2002 | 2 | 10 |
| 2003 | 6 | 12 |
| 2004 | 6 | 9 |
| 2005 | 6 | 14 |
| 2006 | 3 | 15 |
| 2007 | 4 | 10 |
| 2008 | 4 | 12 |
| 2009 | 4 | 21 |
| 2010 | 6 | 17 |
| 2011 | 10 | 13 |
| 2012 | 9 | 13 |
| 2013 | 9 | 17 |
| 2014 | 6 | 10 |
| 2015 | 7 | 9 |
| 2016 | 5 | 14 |
| 2017 | 5 | 4 |
| 2018 | 7 | 5 |
| 2019 | 6 | 16 |
| 2020 | 5 | 9 |
| 2021 | 5 | 22 |
| 2022 | 14 | 19 |
| 2023 | 9 | 12 |
| 2024 | 13 | 7 |
| 2025 | 6 | 13 |
| 2026 | 3 | 7 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for preparing transition metal chalcogenide film and organometalic promoter and forming the same12 May 2026US 12,628,577 B2Korea Advanced Institute of Science and Technology
- Embedded wire chemical vapor deposition (EWCVD)24 Mar 2026US 12,584,214 B2Free Form Fibers, LLC
- Polymer film using chemical vapor deposition using sulfur as initiator (sCVD), method of preparing the same and apparatus for preparing the same24 Feb 2026US 12,558,705 B2Korea Advanced Institute of Science and Technology
- Methods and apparatuses for fabricating polymeric conformal coatings, parts coated with polymeric conformal coatings, and optical apparatus including said parts21 Oct 2025US 12,447,501 B2UCL Business PLC
- Method of manufacturing antifouling coating polymer using initiated chemical vapor deposition23 Sep 2025US 12,421,399 B2Industry-Academic Cooperation Foundation, Chosun University
- In-situ production of h2s or h2se during growth of 2d transition metal disulfide and/or diselenide films27 Aug 2026US 2026/0255890 A1Merck Patent GmbH
- Polymer film using chemical vapor deposition using sulfur as initiator (scvd), method of preparing the same and apparatus for preparing the same14 May 2026US 2026/0131356 A1Korea Advanced Institute of Science and Technology
- Method for tungsten-based thin film deposition via fabrication and decomposition of precursor metastable complexes (molecular species)14 May 2026US 2026/0132506 A1Kalark Nanostructure Sciences Inc.
- Metal chloride gas generation method and apparatus26 Mar 2026US 2026/0085418 A1SanDisk Technologies LLC
- Photoelectric cell with silicon carbide electrode and production method for same19 Feb 2026US 2026/0049404 A1The Yellow SiC Holding GmbH
Most cited
By later US patents
- Process for Polycrystalline film silicon growth529US 6,281,098 B1Midwest Research Institute · 2001
- Methods for atomic layer deposition of hafnium-containing high-K dielectric materials376US 8,282,992 B2APPLIED Materials.Inc. · 2012
- Method of film deposition using activated precursor gases109US 6,838,125 B2APPLIED Materials.Inc. · 2005
- Plasma-induced, in-situ generation, transport and use or collection of reactive precursors102US 5,085,885 AUniversity of Delaware · 1992
- Method of modifying source chemicals in an ald process98US 6,767,582 B1ASM International N.V. · 2004