Polymer film using chemical vapor deposition using sulfur as initiator (scvd), method of preparing the same and apparatus for preparing the same

An apparatus (1) for preparing a polymer film using chemical vapor deposition using sulfur as an initiator (sCVD), the apparatus comprising:

• (a) an sCVD reactor (10);
• (b) a sulfur loading source cell (100) installed at a lower end of the sCVD reactor (10), the sulfur loading source cell (100) being configured to load solid-phase sulfur into the reactor (10) and heated to vaporize sulfur during processing;
• (c) a monomer loading unit (200) connected to an upper end of the sCVD reactor (10), the monomer loading unit (200) being configured to heat a monomer such that the monomer is injected in a gas phase and then is transferred into the sCVD reactor (10) to have a process pressure of 500 to 1500 mTorr;
• (d) a filament (300) made of a high-temperature metal alloy wire, the filament (300) being configured to lower a sulfur rank of the gas-phase sulfur vaporized from the sulfur loading source cell (100) and to transfer the vaporized sulfur to a substrate (400);
• and
• (e) the substrate (400) being mounted such that an upper surface of the substrate (400) faces a lower part of the sCVD reactor (10), the monomer transferred from the monomer loading unit (200) of (c) into the sCVD reactor (10) being adsorbed on the upper surface of the substrate (400), whereby a synthesis reaction between the vaporized sulfur and a polymer is performed on the substrate (400).