C23C 14/35
By application of a magnetic field
Official title: by application of a magnetic field, e.g. magnetron sputtering {(C23C14/3457 takes precedence)}
C23C14/35 (By application of a magnetic field) appears on 2,398 US grants and 3,032 published applications in this corpus.
Search patents in C23C- Granted patents
- 2,398
- Published applications
- 3,032
- Assignees
- 1,147
- Inventors
- 5,934
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 12 | 0 |
| 1978 | 7 | 0 |
| 1979 | 4 | 0 |
| 1980 | 2 | 0 |
| 1981 | 2 | 0 |
| 1982 | 3 | 0 |
| 1983 | 4 | 0 |
| 1984 | 5 | 0 |
| 1985 | 4 | 0 |
| 1986 | 5 | 0 |
| 1987 | 6 | 0 |
| 1988 | 7 | 0 |
| 1989 | 20 | 0 |
| 1990 | 17 | 0 |
| 1991 | 14 | 0 |
| 1992 | 19 | 0 |
| 1993 | 15 | 0 |
| 1994 | 20 | 0 |
| 1995 | 14 | 0 |
| 1996 | 18 | 0 |
| 1997 | 27 | 0 |
| 1998 | 35 | 0 |
| 1999 | 33 | 0 |
| 2000 | 65 | 0 |
| 2001 | 73 | 23 |
| 2002 | 82 | 54 |
| 2003 | 41 | 60 |
| 2004 | 52 | 62 |
| 2005 | 31 | 82 |
| 2006 | 23 | 87 |
| 2007 | 29 | 94 |
| 2008 | 19 | 63 |
| 2009 | 27 | 100 |
| 2010 | 43 | 97 |
| 2011 | 38 | 96 |
| 2012 | 45 | 141 |
| 2013 | 90 | 148 |
| 2014 | 80 | 169 |
| 2015 | 76 | 163 |
| 2016 | 105 | 150 |
| 2017 | 124 | 162 |
| 2018 | 103 | 152 |
| 2019 | 106 | 146 |
| 2020 | 124 | 183 |
| 2021 | 111 | 165 |
| 2022 | 131 | 179 |
| 2023 | 131 | 156 |
| 2024 | 140 | 119 |
| 2025 | 140 | 110 |
| 2026 | 74 | 71 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Method for forming robust hydrophobic surfaces on steel workpiece6 Oct 2026US 12,753,490 B2Hong Kong Applied Science and Technology Research Institute Company Limited
- Tubular sputter cathode29 Sep 2026US 12,747,491 B2BüHler Alzenau GmbH
- Magnetron sputtering apparatus29 Sep 2026US 12,747,493 B2Daegu Gyeongbuk Institute of Science and Technology
- Sputtering apparatus29 Sep 2026US 12,749,665 B2Samsung Display Co., Ltd.
- Cooking utensil22 Sep 2026US 12,740,667 B2Zhejiang Shintown Industry Co., Ltd
- Method for producing transparent conductive coatings for emi protection using hipims8 Oct 2026US 2026/0308745 A1Raytheon Company
- Productive coating process for a steel sheet and corresponding equipment8 Oct 2026US 2026/0308746 A1
- Sputtering apparatus and control method1 Oct 2026US 2026/0297725 A1Tokyo Electron Limited
- In situ and tunable deposition of a film1 Oct 2026US 2026/0297727 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Online adjustment of magnet bars in magnetrons1 Oct 2026US 2026/0302147 A1Soleras Advanced Coatings BV
Most cited
By later US patents
- Apparatus and method for high throughput sputtering366US 5,683,561 AConner Peripherals, Inc. · 1997
- Step coverage and overhang improvement by pedestal bias voltage modulation330US 5,976,327 AAPPLIED Materials.Inc. · 1999
- Magnetron sputtering apparatus and process326US 4,851,095 AOptical Coating Laboratory, Inc. · 1989
- Apparatus for depositing material into high aspect ratio holes273US 5,178,739 AInternational Business Machines Corporation · 1993
- Embedded plasma source for plasma density improvement266US 6,446,572 B1Tokyo Electron Limited · 2002