Magnetron sputtering apparatus
AssigneeDaegu Gyeongbuk Institute of Science and Technology
InventorsJune Seo Kim, Joon Woo Kim
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Abstract
A magnetron sputtering apparatus according to an embodiment of the present disclosure includes a chamber accommodating sputter gas and providing an internal space in which a workpiece is arranged, an ion source unit including a sputtering target providing a deposition material to the workpiece by an electric field formed in the internal space and a magnet arranged at one side of the sputtering target to form a magnetic field, a power supply unit providing power to the ion source unit, and a cooling unit including a cooling device provided outside the chamber and a cold head directly connecting the cooling device to the ion source unit in the internal space, wherein the cold head includes metal, and does not require the introduction of refrigerant.
Claims8
A magnetron sputtering apparatus comprising:
- a chamber accommodating sputter gas and providing an internal space in which a workpiece is arranged;
- an ion source unit including a sputtering target providing a deposition material to the workpiece by an electric field formed in the internal space and a magnet arranged on one side of the sputtering target to form a magnetic field, and a frame on which the sputtering target and the magnet are provided;
- a power supply unit providing power to the ion source unit;
- and
- a cooling unit including a cooling device provided outside the chamber and a cold head directly connecting the cooling device to the ion source unit in the internal space, wherein the cold head includes metal,
- wherein a core and a plurality of disks, having an inner circumferential surface in contact with an outer circumferential surface of the core and spaced apart in a direction in which the core extends, are inserted into the frame, and
- the cold head is in surface contact with the core exposed to one side surface of the frame.
A magnetron sputtering apparatus comprising:
- a chamber accommodating sputter gas and providing an internal space in which a workpiece is arranged;
- an ion source unit including a sputtering target providing a deposition material to the workpiece by an electric field formed in the internal space and a magnet arranged on one side of the sputtering target to form a magnetic field, and a frame on which the sputtering target and the magnet are provided;
- a power supply unit providing power to the ion source unit;
- and
- a cooling unit including a cooling device provided outside the chamber and a cold head directly connecting the cooling device to the ion source unit in the internal space, wherein the cold head includes metal,
- wherein the frame includes a plurality of cores made of a thermally conductive material,
- the plurality of cores being spaced apart from each other and inserted in the form of male screws into one side surface of the frame, and
- the cold head is in surface contact with the plurality of cores exposed to the one side surface of the frame.
Dependencies are inferred from the claim text.