C23C 14/22
Coating by vacuum evaporation, by sputtering or by ion implantation of the
Official title: characterised by the process of coating
C23C14/22 (Coating by vacuum evaporation, by sputtering or by ion implantation of the) appears on 14,913 US grants and 17,759 published applications in this corpus.
Search patents in C23C- Granted patents
- 14,913
- Published applications
- 17,759
- Assignees
- 4,379
- Inventors
- 30,049
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 46 | 0 |
| 1977 | 72 | 0 |
| 1978 | 51 | 0 |
| 1979 | 39 | 0 |
| 1980 | 63 | 0 |
| 1981 | 62 | 0 |
| 1982 | 36 | 0 |
| 1983 | 80 | 0 |
| 1984 | 88 | 0 |
| 1985 | 104 | 0 |
| 1986 | 80 | 0 |
| 1987 | 93 | 0 |
| 1988 | 74 | 0 |
| 1989 | 148 | 0 |
| 1990 | 140 | 0 |
| 1991 | 137 | 0 |
| 1992 | 160 | 0 |
| 1993 | 201 | 0 |
| 1994 | 177 | 0 |
| 1995 | 193 | 0 |
| 1996 | 199 | 0 |
| 1997 | 211 | 0 |
| 1998 | 272 | 0 |
| 1999 | 267 | 0 |
| 2000 | 369 | 0 |
| 2001 | 374 | 168 |
| 2002 | 388 | 383 |
| 2003 | 322 | 449 |
| 2004 | 328 | 475 |
| 2005 | 240 | 520 |
| 2006 | 167 | 539 |
| 2007 | 181 | 555 |
| 2008 | 172 | 535 |
| 2009 | 203 | 723 |
| 2010 | 320 | 699 |
| 2011 | 335 | 756 |
| 2012 | 397 | 758 |
| 2013 | 454 | 831 |
| 2014 | 523 | 872 |
| 2015 | 565 | 945 |
| 2016 | 601 | 910 |
| 2017 | 663 | 978 |
| 2018 | 650 | 859 |
| 2019 | 679 | 852 |
| 2020 | 691 | 901 |
| 2021 | 605 | 843 |
| 2022 | 570 | 828 |
| 2023 | 572 | 715 |
| 2024 | 588 | 717 |
| 2025 | 605 | 556 |
| 2026 | 358 | 392 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- C23C 14/34Sputtering6,971
- C23C 14/24Vacuum evaporation3,948
- C23C 14/56Apparatus specially adapted for continuous coating3,046
- C23C 14/54Controlling or regulating the coating process2,183
- C23C 14/50Substrate holders1,733
- C23C 14/48Ion implantation796
- C23C 14/225Oblique incidence of vaporised material on substrate373
- C23C 14/221Ion beam deposition367
Recent patents
- Mechanical locking sputtering target bonding method and target assemblies produced thereby6 Oct 2026US 12,752,336 B2Solstice Advanced Materials US, Inc.
- Coated cutting tool with an alternating layer composition6 Oct 2026US 12,752,344 B2Walter AG
- Wear resistant coating produced from at least two different AlCr-based targets6 Oct 2026US 12,753,484 B2Oerlikon Surface Solutions AG, PfäFfikon
- Film forming method and film forming apparatus6 Oct 2026US 12,753,485 B2Tokyo Electron Limited
- Optimized crucible assembly and method for physical vapor deposition6 Oct 2026US 12,753,486 B2Essilor International
- Method for producing transparent conductive coatings for emi protection using hipims8 Oct 2026US 2026/0308745 A1Raytheon Company
- Productive coating process for a steel sheet and corresponding equipment8 Oct 2026US 2026/0308746 A1
- Wnix sputtering target8 Oct 2026US 2026/0308747 A1Plansee SE
- Thermally stable metallic glass films via steep compositional gradients8 Oct 2026US 2026/0308748 A1
- Deposition apparatus, thin-film deposition method using the same, and electronic apparatus manufactured using the same8 Oct 2026US 2026/0308749 A1Samsung Display Co., Ltd.
Most cited
By later US patents
- Low pressure vapor phase deposition of organic thin films1,502US 6,337,102 B12002
- Process and apparatus for organic vapor jet deposition1,318US 7,431,968 B1The Trustees of Princeton University · 2008
- Method for producing compound thin films1,267US 4,058,430 A1977
- Modular wafer transport and processing system655US 4,917,556 AVarian Associates, Inc. · 1990
- Wafer holding fixture for chemical reaction processes in rapid thermal processing equipment and method for making same643US 4,978,567 AMaterials Technology Corporation, subsidiary of the Carbon/Graphite Group, Inc. · 1990