WNiX SPUTTERING TARGET

A sputtering target, produced by powder metallurgy, the sputtering target comprising:

• tungsten (W), nickel (Ni), a further metal X selected from group 5 or group 6 of the periodic table, and inevitable impurities;
• the sputtering target having a two-phase microstructure, with one phase being pure W and an other phase being a mixed phase selected from the group consisting of NiWX, NiW, NiX, and mixtures thereof.

A method for producing a WNiX sputtering target by a powder-metallurgical process, the method comprising:

• in a compaction step, producing a blank for the sputtering target by compacting a powder mixture of a tungsten (W) powder, a nickel (Ni) powder, and a powder of a further metal X selected from group 5 or group 6 of the periodic table, by applying to the powder mixture pressure, heat, or pressure and heat to produce the blank.