C23C 14/52
Means for observation of the coating process
C23C14/52 (Means for observation of the coating process) appears on 105 US grants and 135 published applications in this corpus.
Search patents in C23C- Granted patents
- 105
- Published applications
- 135
- Assignees
- 90
- Inventors
- 353
- Latest grant
- 16 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 3 | 5 |
| 2003 | 1 | 0 |
| 2004 | 1 | 1 |
| 2005 | 2 | 1 |
| 2006 | 0 | 1 |
| 2007 | 0 | 0 |
| 2008 | 1 | 3 |
| 2009 | 2 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 3 |
| 2012 | 1 | 3 |
| 2013 | 1 | 1 |
| 2014 | 3 | 7 |
| 2015 | 2 | 10 |
| 2016 | 3 | 6 |
| 2017 | 8 | 7 |
| 2018 | 6 | 6 |
| 2019 | 3 | 4 |
| 2020 | 12 | 8 |
| 2021 | 3 | 19 |
| 2022 | 6 | 10 |
| 2023 | 8 | 15 |
| 2024 | 17 | 8 |
| 2025 | 10 | 12 |
| 2026 | 6 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- In situ and tunable deposition of a film16 Jun 2026US 12,655,515 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Coating chamber with distance detection for the substrates26 May 2026US 12,637,758 B2Singulus Technologies AG
- Anti-stick coatings including fluorophores19 May 2026US 12,629,198 B2Gyrus ACMI, Inc.
- Systems and methods for determining residual compounds in plasma process19 May 2026US 12,635,454 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Module for flipping substrates in vacuum7 Apr 2026US 12,595,552 B2APPLIED Materials.Inc.
- Computer Implemented Method for Predicting a Level of Quality of a Vacuum into a Vacuum Chamber of a Coating Machine, and Corresponding Device8 Oct 2026US 2026/0308751 A1Essilor International
- In situ and tunable deposition of a film1 Oct 2026US 2026/0297727 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Source arrangement and thermal laser epitaxy system16 Jul 2026US 2026/0201540 A1Max-Planck-Gesellschaft Zur FöRderung Der Wissenschaften E. V.
- Protection device, detection system, and a method therefor14 May 2026US 2026/0133471 A1Von Ardenne Asset GmbH & Co. KG
- Physical vapor deposition chamber with target surface morphology monitor19 Feb 2026US 2026/0049391 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Electron beam physical vapor deposition apparatus21US 6,946,034 B1General Electric Company · 2005
- Methods and apparatus for shutter disk assembly detection20US 10,851,453 B2APPLIED Materials.Inc. · 2020
- Hybrid charged-particle beam and light beam microscopy20US 9,564,291 B1Mochii, Inc. · 2017
- System for monitoring material dispensed onto a substrate15US 5,026,989 ANordson Corporation · 1991
- Gas cluster ion beam size diagnostics and workpiece processing12US 6,831,272 B2Epion Corporation · 2004