Source arrangement and thermal laser epitaxy system

Thermal laser epitaxy (TLE) system for coating a surface of a substrate with a layer comprising one or more source materials, comprising a reaction chamber enclosing a reaction volume sealable with respect to the ambient atmosphere, a gas system for providing an adjustable reaction atmosphere within the reaction volume, an arrangement means for arranging a substrate within the reaction volume, a substrate heating means for heating the substrate, a laser system for providing one or more laser beams for evaporating and/or sublimating the one or more source materials, and a source arrangement for providing the one or more source materials within the reaction chamber, wherein the source arrangement comprises a holding device with a movable holding structure with one or more holding spaces for the arrangement of one or more source elements providing a source material to be evaporated and/or sublimated by a laser beam of the TLE system for a coating of a substrate of the TLE system, further comprises an actuator mechanically coupled to the holding structure, whereby the actuator is constructed to move the holding structure between two or more holding positions, wherein in a first holding position of the two or more holding positions one of the one or more source elements arranged in the respective holding spaces is positional along the laser beam at a first interaction position, and wherein in a second holding position of the two or more holding positions one of the one or more source elements arranged in the respective holding spaces is positional along the laser beam at a second interaction position different to the first interaction position, and wherein one or more source elements providing the one or more source materials are arranged in the respective holding spaces of the source arrangement.