US 2026/0308749 A1Published application

Deposition apparatus, thin-film deposition method using the same, and electronic apparatus manufactured using the same

AssigneeSamsung Display Co., Ltd.

InventorsJEONGWON HAN, JAEWON SHIM, SUKWON JUNG

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Abstract

A deposition apparatus includes a first support part, a mask frame disposed on the first support part and defining a frame opening, a mask disposed on an upper surface of the mask frame and defining a mask opening, an electrostatic chuck disposed on the mask with a substrate disposed thereunder, a second support part movable in a first direction and disposed on the first support part with a first support opening defined in an upper surface and a second support opening defined in a lower surface, a (1-1)-th stage disposed in the first support opening and rotating about a rotation axis, a (1-2)-th stage disposed on the (1-1)-th stage and defining first openings, a (2-1)-th stage disposed in the second support opening and rotating about the rotation axis, a (2-2)-th stage disposed on the (2-1)-th stage and defining second openings, and sensors respectively disposed in the first and second openings.

Claims20

Dependent claims

A deposition apparatus comprising:

a first support part;
a mask frame which is disposed on the first support part, and in which a frame opening is defined;
a mask which is disposed on an upper surface of the mask frame, and in which a mask opening is defined;
an electrostatic chuck which is disposed on the mask, and under which a substrate is disposed;
a second support part, which is disposed on the first support part, with a first support opening defined in an upper surface and a second support opening defined in a lower surface;
a (1-1)-th stage disposed in the first support opening, and configured to rotate about a rotation axis perpendicular to a plane;
a (1-2)-th stage which is disposed on the (1-1)-th stage, and in which a plurality of first openings are defined;
a (2-1)-th stage disposed in the second support opening, and configured to rotate about the rotation axis perpendicular to the plane;
a (2-2)-th stage which is disposed on the (2-1)-th stage, and in which a plurality of second openings are defined;
and
a plurality of sensors respectively disposed in the plurality of first openings and the plurality of second openings,
wherein the second support part is movable in a first direction.

9 more elements

A thin-film deposition method comprising:

disposing, on a first support part, a mask frame in which a frame opening is defined;
disposing a mask on an upper surface of the mask frame;
disposing an electrostatic chuck on the mask;
disposing, on the first support part, a second support part with a first support opening defined in an upper surface and a second support opening defined in a lower surface;
disposing, in the first support opening, a (1-1)-th stage configured to rotate about a rotation axis perpendicular to a plane;
disposing, on the (1-1)-th stage, a (1-2)-th stage in which a plurality of first openings are defined;
disposing, in the second support opening, a (2-1)-th stage configured to rotate about the rotation axis perpendicular to the plane;
disposing, on the (2-1)-th stage, a (2-2)-th stage in which a plurality of second openings are defined;
disposing a plurality of sensors respectively in the plurality of first openings and the plurality of second openings;
moving the second support part in a first direction;
measuring a flatness of the electrostatic chuck and a degree of sagging of the mask;
moving the electrostatic chuck in a third direction crossing both the first direction and a second direction crossing the first direction;
disposing a substrate on a lower surface of the electrostatic chuck;
measuring a flatness of the substrate;
moving the second support part in a direction opposite to the first direction;
and
depositing a deposition material on the substrate.

14 more elements

Dependencies are inferred from the claim text.