C23C 14/228
Gas flow assisted pvd deposition
Official title: {Gas flow assisted PVD deposition}
C23C14/228 (Gas flow assisted pvd deposition) appears on 359 US grants and 475 published applications in this corpus.
Search patents in C23C- Granted patents
- 359
- Published applications
- 475
- Assignees
- 247
- Inventors
- 924
- Latest grant
- 11 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 5 | 0 |
| 1978 | 2 | 0 |
| 1979 | 2 | 0 |
| 1980 | 0 | 0 |
| 1981 | 2 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 2 | 0 |
| 1990 | 3 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 4 | 0 |
| 1995 | 0 | 0 |
| 1996 | 4 | 0 |
| 1997 | 3 | 0 |
| 1998 | 6 | 0 |
| 1999 | 3 | 0 |
| 2000 | 12 | 0 |
| 2001 | 4 | 3 |
| 2002 | 10 | 11 |
| 2003 | 7 | 16 |
| 2004 | 13 | 20 |
| 2005 | 7 | 27 |
| 2006 | 7 | 13 |
| 2007 | 7 | 9 |
| 2008 | 8 | 20 |
| 2009 | 4 | 24 |
| 2010 | 14 | 24 |
| 2011 | 11 | 24 |
| 2012 | 14 | 14 |
| 2013 | 14 | 33 |
| 2014 | 13 | 23 |
| 2015 | 20 | 24 |
| 2016 | 12 | 28 |
| 2017 | 10 | 21 |
| 2018 | 19 | 26 |
| 2019 | 13 | 18 |
| 2020 | 16 | 21 |
| 2021 | 19 | 22 |
| 2022 | 12 | 13 |
| 2023 | 16 | 17 |
| 2024 | 10 | 13 |
| 2025 | 14 | 6 |
| 2026 | 9 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Coating drum and system for vapor deposition11 Aug 2026US 12,703,909 B2Skycap Investment Holdings Inc.
- Additive nanomanufacturing system and method30 Jun 2026US 12,668,868 B2Auburn University
- Organic vapor jet printing system12 May 2026US 12,628,545 B2Universal Display Corporation
- Vacuum coating apparatus for uniformly distributing metal vapor using uniform mixing buffer structure5 May 2026US 12,618,143 B2
- Processing apparatus and gas supply method28 Apr 2026US 12,613,005 B2Tokyo Electron Limited
- Productive coating process for a steel sheet and corresponding equipment8 Oct 2026US 2026/0308746 A1
- Methods for Perovskite Device Processing by Vapor Transport Deposition16 Jul 2026US 2026/0201538 A1First Solar, Inc.
- Substrate processing apparatus and a substrate processing method16 Jul 2026US 2026/0201545 A1Tokyo Electron Limited
- Semiconductor structure and method for forming the same19 Mar 2026US 2026/0082661 A1Shanghai GTX Semiconductor Co., Ltd.
- Organic vapor jet printing system12 Mar 2026US 2026/0071314 A1Universal Display Corporation
Most cited
By later US patents
- Process and apparatus for organic vapor jet deposition1,318US 7,431,968 B1The Trustees of Princeton University · 2008
- Method and an apparatus for generation of a discharge in own vapors of a radio frequency electrode for sustained self-sputtering and evaporation of the electrode239US 5,716,500 ASurfcoat Oy · 1998
- Manufacturing method for thin-film solar cells123US 6,635,307 B2Nanotek Instruments, Inc. · 2003
- Method and apparatus for the deposition of solid films of a material from a jet stream entraining the gaseous phase of said material114US 4,788,082 A1988
- Device for the rapid depositing of oxides in thin layers which adhere well to plastic supports112US 4,006,340 ACompagnie Industrielle des Telecommunications Cit-Alcatel · 1977